Forming-free Mott-oxide threshold selector nanodevice showing s-type NDR with high endurance (> 1012 cycles), excellent Vth stability (5%), fast (< 10 ns) switching, and promising scaling properties

T. Hennen, D. Bedau, J. Rupp, C. Funck, S. Menzel, M. Grobis, R. Waser, D. Wouters
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引用次数: 12

Abstract

In this work, thin film (down to 10 nm) $(\mathrm{V}_{1-\mathrm{x}}\text{Cr}_{\mathrm{x}})_{2}\mathrm{O}_{3}$ Mott-oxide based nano-devices (electrode width down to 120 nm) are fabricated for the first time. The devices show volatile threshold switching and NDR caused by thermal feedback. Fast (< 10 ns) and very stable (< 5% variation) cycle to cycle threshold switching is obtained over 1012 cycles. Thickness and area dependence of the NDR curves are consistent with uniform volume switching and are explained with a thermal feedback model calibrated to the temperature dependent conductance of the $(\mathrm{V}_{1-\mathrm{x}}\text{Cr}_{\mathrm{x}})_{2}\mathrm{O}_{3}$ films, enabling predictions for further scaled device geometries.
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无形成Mott-oxide阈值选择器纳米器件具有s型NDR,具有高耐久性(> 1012次循环),优异的Vth稳定性(5%),快速(< 10 ns)切换和有前途的缩放性能
在这项工作中,首次制备了薄膜(低至10 nm) $(\mathrm{V}_{1} -\mathrm{x}}\text{Cr}_{\mathrm{x}})_{2}\mathrm{O}_{3}$ moot -氧化物基纳米器件(电极宽度低至120 nm)。器件表现出易失性阈值开关和热反馈引起的NDR。在1012个周期内获得快速(< 10 ns)和非常稳定(< 5%变化)的周期到周期阈值切换。NDR曲线的厚度和面积依赖关系与均匀体积开关一致,并使用校准到$(\ mathm {V} {1-\ mathm {x}}\text{Cr} {\ mathm {x}})_{2}\ mathm {O}}{3}$薄膜的温度依赖电导的热反馈模型来解释,从而能够预测进一步缩放的器件几何形状。
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