T. Hennen, D. Bedau, J. Rupp, C. Funck, S. Menzel, M. Grobis, R. Waser, D. Wouters
{"title":"Forming-free Mott-oxide threshold selector nanodevice showing s-type NDR with high endurance (> 1012 cycles), excellent Vth stability (5%), fast (< 10 ns) switching, and promising scaling properties","authors":"T. Hennen, D. Bedau, J. Rupp, C. Funck, S. Menzel, M. Grobis, R. Waser, D. Wouters","doi":"10.1109/IEDM.2018.8614618","DOIUrl":null,"url":null,"abstract":"In this work, thin film (down to 10 nm) $(\\mathrm{V}_{1-\\mathrm{x}}\\text{Cr}_{\\mathrm{x}})_{2}\\mathrm{O}_{3}$ Mott-oxide based nano-devices (electrode width down to 120 nm) are fabricated for the first time. The devices show volatile threshold switching and NDR caused by thermal feedback. Fast (< 10 ns) and very stable (< 5% variation) cycle to cycle threshold switching is obtained over 1012 cycles. Thickness and area dependence of the NDR curves are consistent with uniform volume switching and are explained with a thermal feedback model calibrated to the temperature dependent conductance of the $(\\mathrm{V}_{1-\\mathrm{x}}\\text{Cr}_{\\mathrm{x}})_{2}\\mathrm{O}_{3}$ films, enabling predictions for further scaled device geometries.","PeriodicalId":152963,"journal":{"name":"2018 IEEE International Electron Devices Meeting (IEDM)","volume":"50 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE International Electron Devices Meeting (IEDM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2018.8614618","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 12
Abstract
In this work, thin film (down to 10 nm) $(\mathrm{V}_{1-\mathrm{x}}\text{Cr}_{\mathrm{x}})_{2}\mathrm{O}_{3}$ Mott-oxide based nano-devices (electrode width down to 120 nm) are fabricated for the first time. The devices show volatile threshold switching and NDR caused by thermal feedback. Fast (< 10 ns) and very stable (< 5% variation) cycle to cycle threshold switching is obtained over 1012 cycles. Thickness and area dependence of the NDR curves are consistent with uniform volume switching and are explained with a thermal feedback model calibrated to the temperature dependent conductance of the $(\mathrm{V}_{1-\mathrm{x}}\text{Cr}_{\mathrm{x}})_{2}\mathrm{O}_{3}$ films, enabling predictions for further scaled device geometries.