Cryo-CMOS Compact Modeling

C. Enz, A. Beckers, F. Jazaeri
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引用次数: 13

Abstract

This paper highlights some of the challenges faced for the modeling of MOSFET devices for operation at cryogenic temperature (CT). A special focus is given on the modeling of the threshold voltage VT and the subthreshold swing SS. The significant increase of VT at CT reduces the available overdrive voltage and therefore needs to be modeled properly. The SS saturates to a constant value below a critical temperature Tc of typically 40 K. This mitigates the current saving that could be expected from reducing the temperature since the transconductance for a given current does not scale inversely with 1/T below Tc. A correct modeling of these two phenomena is therefore key for developing an improved compact model (CM) that scales with T from RT down to CT.
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Cryo-CMOS紧凑建模
本文重点介绍了在低温下工作的MOSFET器件建模所面临的一些挑战。特别关注阈值电压VT和亚阈值摆幅SS的建模。VT在CT处的显著增加降低了可用的超速电压,因此需要适当建模。SS饱和到一个恒定的值低于临界温度Tc通常为40k。由于给定电流的跨导在低于Tc的情况下不会与1/T成反比,因此这减轻了降低温度可能带来的电流节省。因此,这两种现象的正确建模是开发改进的紧凑型模型(CM)的关键,该模型随T从RT降至CT。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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