Geometry modeling method for narrow/short and narrow MOSFETs

S. Sekine, M. Sugiyama, N. Saito
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引用次数: 2

Abstract

In this paper, we present a new physics-based model for narrow width MOSFETs that accounts for the LOCOS narrow width effect and the webbing effect. The model is based on physical geometry changes of MOSFETs that are caused by the changes in field edge shape during LOCOS isolation and consecutive oxide etch, and the webbing effect of lithography for the dog-bone layout. It allows the use of a single set of parameters for any combination of MOSFET widths and lengths without geometry binning. We also discuss details of the test structures and the modeling procedure, and model implementation in SPICE simulation.
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窄/短和窄mosfet的几何建模方法
在本文中,我们提出了一个新的基于物理的窄宽度mosfet模型,该模型考虑了LOCOS窄宽度效应和带效应。该模型基于LOCOS隔离和连续氧化蚀刻过程中场边缘形状变化引起的mosfet物理几何变化,以及光刻对狗骨布局的网状效应。它允许对MOSFET宽度和长度的任何组合使用一组参数,而不需要几何形状的分割。本文还详细讨论了测试结构和建模过程,以及在SPICE仿真中的模型实现。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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