Epitaxial lateral overgrowth of GaAsP/Si for tandem solar cell

A. Strömberg, B. Manavaimaran, L. Srinivasan, S. Lourdudoss, Y. Sun
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Abstract

High crystal quality GaAsP/Si fabricated by cost effective heteroepitaxial technology is promising to realize low-cost Si based tandem solar cell with efficiency higher than 30%. In this work, epitaxial lateral overgrowth (ELOG) of GaAsP/GaAs and GaAsP/GaAs/Si by hydride vapor phase epitaxy (HVPE) and their properties are studied by photoluminescence (PL) mapping. High crystal quality ELOG GaAsP/Si is obtained with enhanced PL intensity and narrow line width indicating reduced defect density provided by ELOG approach.
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串联太阳能电池用GaAsP/Si外延横向过度生长
采用高性价比的异质外延技术制备高晶体质量的GaAsP/Si,有望实现效率高于30%的低成本硅基串联太阳能电池。本文研究了氢化物气相外延(HVPE)对GaAsP/GaAs和GaAsP/GaAs/Si的外延横向过生长(ELOG)及其特性。获得了高晶体质量的ELOG GaAsP/Si,其PL强度增强,线宽窄,表明ELOG方法降低了缺陷密度。
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