The multistable memory effect in accumulation mode SOI MOSFETs at low temperatures

M. Gao, E. Simoen, C. Claeys, G. Declerck
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Abstract

The multistable V/sub T/ behavior of silicon-on-insulator (SOI) MOSFETs is considered. This phenomenon, the MCCM (multistable charge controlled memory) effect, was first found in non-fully depleted SOI n-MOSFET samples operating at 77 K when negative back gate bias V/sub G2/ was applied. When the applied V/sub G2/ was swept from zero-voltage towards a negative value, e.g. -40 V, the V/sub T/ of the front gate would shift higher with rather good linearity within a V/sub G2/ span of about 20-30 V. The increase in V/sub T/ can be up to 2-3 V. The MCCM effect is only related to the coupling between the front and the back gates and does not depend on whether there are junctions or a potential well in the body. All the transistors investigated operate in the non-fully depleted regime for both high and low states at both room and low temperatures. The measurement results show that such multi-stable V/sub T/ behavior also occurs in the N/sup +/N/sup -/N/sup +/ accumulation mode SOI n-MOSFETs.<>
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低温下累积模式SOI mosfet的多稳态记忆效应
考虑了绝缘体上硅(SOI) mosfet的多稳态V/sub /行为。这种现象,即MCCM(多稳定电荷控制记忆)效应,首次在工作在77 K的非完全耗尽SOI n-MOSFET样品中发现,当施加负背极偏置V/sub G2/时。当施加的V/sub G2/从零电压扫向负值时,例如-40 V,前门的V/sub T/将在约20-30 V的V/sub G2/范围内以相当好的线性度更高。V/sub T/的增量可达2-3 V。MCCM效应仅与前后通道之间的耦合有关,与体内是否存在连接或电位井无关。所研究的所有晶体管在室温和低温下的高、低状态下都在非完全耗尽状态下工作。测量结果表明,在N/sup +/N/sup -/N/sup +/积累模式的SOI - N - mosfet中也出现了这种多稳定的V/sub / T/行为
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