Characterization of Near-field Emission and Structure of an SLD by Polarization Parametric Indirect Microscopic Imaging

Bin Ni, Wei Chen, Shengwei Ye, Lu Xue, Lianping Hou, John Haig Marsh, Kai Gu, Chaofu Sun, Xuefeng Liu, Jichuan Xiong
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Abstract

Abstract In this paper, a novel polarization parametric indirect microscopic imaging (PIMI) method is utilized for the first time to characterize the near-field emission mode and end-face structure of nanoscale semiconductor light-emitting chips. Via polarization modulation and detection of the emitted light from an SLD chip, abundant information including the distinct border of the emission mode, which cannot be seen by the traditional method, is collected and visualized as the form of multi-dimensional photon state distribution images. The polarization property distribution of the emission mode was visualized for the first time. Besides, by concurrent analysis of PIMI images of the end-face structure and emission mode, potential impurities adhered to the emitting facet can be precisely screened and located. The proposed method here has considerable advantages in the characterization of the light-emitting devices, paving a new way for precise, convenient, cost-effective, and large-scale quality inspection in industries.
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偏振参数间接显微成像表征SLD的近场发射和结构
本文首次利用一种新的偏振参数间接显微成像(PIMI)方法对纳米级半导体发光芯片的近场发射模式和端面结构进行了表征。通过对SLD芯片发射光的偏振调制和检测,可以收集到传统方法无法看到的丰富信息,包括发射模式的明显边界,并以多维光子态分布图像的形式可视化。首次可视化了发射模式的偏振特性分布。此外,通过对端面结构和发射方式的PIMI图像进行同步分析,可以精确地筛选和定位粘附在发射面上的潜在杂质。本文提出的方法在发光器件的表征方面具有相当大的优势,为工业中精确、方便、经济、大规模的质量检测铺平了新的道路。
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