Enhanced performance of AlGaN-based deep-UV LED by incorporating carrier injection balanced modulation layer synergistically with polarization-regulating structures

Xun Hu, Lijing Kong, Pan Yang, Na Gao, Huang Kai, Shuping Li, Junyong Kang, Rong Zhang
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Theoretical simulations demonstrate the mitigation of abrupt variations in Al content at the interface between EBL/p-AlGaN and p-AlGaN/p-GaN within the valence bands. Consequently, holes are more likely to be injected into the active region rather than accumulating at these interfaces. Meanwhile, due to the reduced barrier height at the top of the valence band, the holes were efficiently transported into the quantum well and confined with comparable and balanced concentrations of electrons by suppressing overflow, thereby promoting the radiative recombination rate. Compared with the conventional DUV LED, the hole concentration and radiative recombination rate of the designed structure in the final quantum well are significantly increased to 179.8% and 232.3%, respectively. The spontaneous emission intensity achieves nearly twice at the same current injection density. Moreover, the efficiency droop is significantly suppressed when operated at a gradually increasing current density. This study presents a promising approach that can serve as a reference for achieving high-efficiency AlGaN-based DUV LEDs.
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Abstract

Abstract A comparable concentration of carriers injected and transported into the active region, that is, balanced hole and electron injection, significantly affects the optoelectronic performance of AlGaN-based deep ultraviolet light emitting diodes (DUV LEDs). In this study,-we introduce a novel structure characterized by a carrier injection balanced modulation layer, incorporating a polarization-regulating gradient p-AlGaN in a DUV LED. We conducted a systematic examination of its impact on the carrier injection and transport processes.
Theoretical simulations demonstrate the mitigation of abrupt variations in Al content at the interface between EBL/p-AlGaN and p-AlGaN/p-GaN within the valence bands. Consequently, holes are more likely to be injected into the active region rather than accumulating at these interfaces. Meanwhile, due to the reduced barrier height at the top of the valence band, the holes were efficiently transported into the quantum well and confined with comparable and balanced concentrations of electrons by suppressing overflow, thereby promoting the radiative recombination rate. Compared with the conventional DUV LED, the hole concentration and radiative recombination rate of the designed structure in the final quantum well are significantly increased to 179.8% and 232.3%, respectively. The spontaneous emission intensity achieves nearly twice at the same current injection density. Moreover, the efficiency droop is significantly suppressed when operated at a gradually increasing current density. This study presents a promising approach that can serve as a reference for achieving high-efficiency AlGaN-based DUV LEDs.
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利用载流子注入平衡调制层与偏振调节结构协同作用,提高了algan基深紫外LED的性能
注入和输送到有源区的载流子浓度相当,即空穴和电子注入平衡,显著影响着gan基深紫外发光二极管(DUV LEDs)的光电性能。在这项研究中,我们引入了一种新的结构,其特征是载流子注入平衡调制层,在DUV LED中加入了偏振调节梯度p-AlGaN。我们对其对载流子注入和输运过程的影响进行了系统的研究。理论模拟表明,在价带内EBL/p-AlGaN和p-AlGaN/p-GaN之间的界面上,Al含量的突变变化得到了缓解。因此,孔洞更有可能被注入到活性区,而不是在这些界面处聚集。同时,由于价带顶部的势垒高度降低,空穴被有效地传输到量子阱中,并通过抑制溢出被限制在相当且平衡的电子浓度中,从而提高了辐射复合速率。与传统DUV LED相比,设计的结构在最终量子阱中的空穴浓度和辐射复合率分别显著提高到179.8%和232.3%。在相同电流注入密度下,自发发射强度达到近两倍。此外,当电流密度逐渐增大时,效率下降得到明显抑制。本研究提出了一种很有前途的方法,可以作为实现高效algan基DUV led的参考。
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