Mid-infrared thermal radiation resonating with longitudinal-optical like phonon from n++-doped GaN–semi-insulating GaN grating structure

Bojin Lin, Hnin Lai Lai Aye, Kohei Ueno, Hiroshi Fujioka, Hideto Miyake, Yoshihiro Ishitani
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Abstract

The mid-infrared emission mechanism of line-and-space structures of metallic plates on dielectric materials is substantiated using high conductive n-doped (n++-) GaN–semi-insulating (SI-) GaN microstripe structures on an SI-GaN epitaxial layer, which was veiled when using line-and-space structures of Au plates. The present structure exhibits a few thermal emission lines originating from electric dipoles resonating with the coherent longitudinal optical (LO) phonon-like lattice vibration, which are formed by the local depolarization electric field in the surface n++-GaN/SI-GaN/n++-GaN regions. The energies of the LO-phonon-like modes shift from the original LO-phonon energy of GaN to the lower energy region, which contrasts with the LO-phonon resonant emission from the microstructures on GaAs. These emission lines have another notable feature, i.e. the observed peak energies are independent of the polar emission angle for both s- and p-polarizations, unlike the emissions by surface phonon polaritons showing a significant directive nature of peak energies. The results show that each peak energy of the present emission lines is positioned at the zero-point of the real part of the electric permittivity comprising the components of the transverse optical phonon and other electric dipoles induced by the LO-like modes, excluding the target mode. The significant peak-energy shift of the LO-like phonons is applicable to materials with wide Reststrahlen bands, which contrasts with that of the nearly LO-phonon resonating feature of materials with narrow Reststrahlen bands, such as GaAs. The peak energy shift depending on the emission direction is observed for Au–GaN stripe structures. This property is ascribed to the imperfect Au/GaN interface with surface states through the theoretical analysis of the modified electric permittivity in the surface region, numerical simulation of the local electric field via finite-difference time-domain calculation, and experimental studies on a Ti–GaN structure and emission peaks originating from an LO-like phonon of the α-Al2O3 substrate.
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掺氮GaN -半绝缘GaN光栅结构中红外热辐射与纵向光学类声子共振
摘要利用高导电性的n掺杂(n ++ -) GaN半绝缘(SI-) GaN微条纹结构,在SI-GaN外延层上证实了金属板在介质材料上的线空结构的中红外发射机制,而在使用Au板的线空结构时则掩盖了这一结构。在n ++ -GaN/SI-GaN/n ++ -GaN表面局部去极化电场的作用下,产生了与相干纵向光学(LO)类声子晶格振动共振的电偶极子热发射谱线。类lo声子模式的能量从GaN的原始lo声子能量转移到较低的能量区域,这与GaAs上微结构的lo声子共振发射形成对比。这些发射谱线还有一个显著的特征,即观测到的峰值能量与s极化和p极化的极发射角无关,而表面声子极化子的发射则显示出显著的峰值能量指导性。结果表明,当前发射线的每个峰值能量都位于电介电常数实部的零点处,该实部由横向光学声子和其他由类低能级模式诱导的电偶极子组成,不包括目标模式。类lo声子的显著峰能位移适用于具有宽Reststrahlen带的材料,这与具有窄Reststrahlen带的材料(如GaAs)的近lo声子谐振特性形成对比。在Au-GaN条纹结构中观察到随发射方向变化的峰值能量偏移。通过对表面修正电介电常数的理论分析、时域有限差分计算对局部电场的数值模拟,以及对Ti-GaN结构和α - al2o3衬底的lo型声子发射峰的实验研究,将这种特性归因于表面态不完善的Au/GaN界面。
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