Far-field pattern control and light-extraction enhancement of deep-ultraviolet light-emitting diodes with large-area Fresnel zone plate nano-structures
{"title":"Far-field pattern control and light-extraction enhancement of deep-ultraviolet light-emitting diodes with large-area Fresnel zone plate nano-structures","authors":"Lingjie Wei, Manabu Taniguchi, Guo-Dong Hao, Shin-ichiro Inoue","doi":"10.1088/1361-6463/ad056a","DOIUrl":null,"url":null,"abstract":"Abstract Conventional methods using high-purity quartz lenses to control deep-ultraviolet light-emitting diode (DUV-LED) far-field patterns have limitations, including small effective apertures and high cost. We apply phase-type Fresnel zone plates to control the beam angle and enhance light extraction efficiency (LEE) for DUV-LEDs on sapphire and AlN substrates. We demonstrate highly-collimated optics-free DUV-LED emissions with full width at half maximum far-field divergence angles of 40° and 10° on sapphire and AlN substrates at a peak emission wavelength of 279 nm and 273 nm, respectively. LEE enhancements of 1.4 and 1.5 times for DUV-LEDs on sapphire and AlN substrates, respectively, are also achieved.","PeriodicalId":16833,"journal":{"name":"Journal of Physics D","volume":"19 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Physics D","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/1361-6463/ad056a","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract
Abstract Conventional methods using high-purity quartz lenses to control deep-ultraviolet light-emitting diode (DUV-LED) far-field patterns have limitations, including small effective apertures and high cost. We apply phase-type Fresnel zone plates to control the beam angle and enhance light extraction efficiency (LEE) for DUV-LEDs on sapphire and AlN substrates. We demonstrate highly-collimated optics-free DUV-LED emissions with full width at half maximum far-field divergence angles of 40° and 10° on sapphire and AlN substrates at a peak emission wavelength of 279 nm and 273 nm, respectively. LEE enhancements of 1.4 and 1.5 times for DUV-LEDs on sapphire and AlN substrates, respectively, are also achieved.
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