Anomalous Hall effect in naturally oxidized normal-metal Al/Cu double films

Lijuan Zhao, Yuzhi Li, Yongzuo Wang, Peng Chen, Bing Lv, Cunxu Gao
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Abstract

Abstract An unexpectedly larger current-induced spin–orbit torque in oxidized Cu (CuO x )/ferromagnet (FM) than heavy-metal/FM has recently attracted intense attention in spintronic studies. Although the two mechanisms, interfacial Rashba Edelstein effect and spin-vorticity coupling, have been put forward based on the two different conductive features of CuO x , i.e. electrical insulator and gradient of electrical mobility, the detailed investigation of transport of CuO x is still lacking. Here we experimentally report the positive and negative anomalous Hall effect (AHE) in naturally oxidized normal-metal Al/Cu double films. We found that the onset temperature of AHE corresponds to magnetic transition temperature of CuO x . Furthermore, by comparing Hall resistance of the crystalline and amorphous Cu/Al double films, we identify that the positive anomalous Hall resistance attributes to magnetic moment of CuO x itself, while the negative anomalous Hall resistance can originate from the spin or orbital currents generated at the CuO x /AlO x interface interact with magnetization of CuO x and its inverse process.
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自然氧化铝/铜双膜的反常霍尔效应
氧化Cu (CuO x)/铁磁体(FM)中电流诱导的自旋轨道转矩比重金属/FM大,近年来在自旋电子学研究中引起了广泛关注。虽然基于CuO x的电绝缘体和电迁移率梯度这两种不同的导电特性,提出了界面Rashba Edelstein效应和自旋涡耦合两种机制,但对CuO x的输运还缺乏详细的研究。在这里,我们实验报道了自然氧化的正常金属Al/Cu双膜中的正、负异常霍尔效应。我们发现AHE的起始温度与CuO x的磁转变温度相对应。此外,通过比较结晶和非晶双膜的霍尔电阻,我们发现正异常霍尔电阻归因于CuO x本身的磁矩,而负异常霍尔电阻可能源于CuO x /AlO x界面上产生的自旋或轨道电流与CuO x的磁化及其逆过程相互作用。
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