Determination of scattering and Urbach absorption contributions to the light extinction in PTFE films by using graphical representation technique and numerical solution of the inverse problem

IF 1.1 Q4 QUANTUM SCIENCE & TECHNOLOGY Semiconductor Physics Quantum Electronics & Optoelectronics Pub Date : 2023-09-20 DOI:10.15407/spqeo26.03.303
M.V. Sopinskyy, K.P. Grytsenko, C. Villringer, Yu.V. Kolomzarov, S. Schrader
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Abstract

Ellipsometrically obtained spectral dependences of ordinary αxy and extra-ordinary αz extinction/attenuation coefficients within the spectral range λ = 300…980 nm of uniaxially anisotropic polytetrafluoroethylene (PTFE) films were analyzed. We considered the capabilities and specific features of the graphical representation technique for determining the contribution of Rayleigh scattering and Urbach absorption to light attenuation in the spectral range beyond fundamental absorption. It has been shown that the graphical approach enables to estimate these contributions qualitatively, semi-quantitatively or quantitatively, depending on the situation. The conclusions made using the analysis of graphical representation are confirmed by numerical solution of the inverse problem via simulation of the αxy (λ), αz (λ) experimental dependences within the framework of a best-fit procedure. Being based on both of these approaches, we have ascertained that, in the as-prepared PTFE films, the so-called anomalous light scattering (ALS) with the spectral dependence of scattering coefficient αs ≈ as λ–p (p > 4) takes place. Transformation of scattering from ALS to the Rayleigh one with p ≈ 4 due to annealing is accompanied by an increase of Urbach (subband) absorption. Both of these factors cause narrowing the dynamic range of extinction coefficient values. Both scattering and absorption coefficients are higher for the component of light polarized along the normal to the substrate as compared to the component polarized in parallel to it. The relationship between observed behavior of the scattering and absorption coefficients and the film structure has been discussed.
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用图形表示技术和反问题的数值解法测定聚四氟乙烯薄膜中散射和乌尔巴赫吸收对光消的贡献
利用椭偏法分析了单轴各向异性聚四氟乙烯(PTFE)薄膜在λ = 300 ~ 980 nm光谱范围内普通αxy和特殊αz消光/衰减系数的光谱依赖性。我们考虑了图形表示技术的能力和具体特征,以确定瑞利散射和乌尔巴赫吸收对光谱范围内光衰减的贡献。已经表明,图表方法能够根据具体情况定性、半定量或定量地估计这些贡献。通过对αxy (λ), αz (λ)实验依赖关系在最佳拟合过程框架内的反问题的数值解,证实了通过图形表示分析得出的结论。基于这两种方法,我们已经确定,在制备的PTFE薄膜中,所谓的异常光散射(ALS)与散射系数αs≈λ-p (p >4)发生;退火后的ALS散射向p≈4的瑞利散射转变伴随着厄巴赫(子带)吸收的增加。这两个因素都导致消光系数值的动态范围变窄。与平行于基材的偏振分量相比,沿基材法线偏振的光分量的散射和吸收系数都更高。讨论了所观察到的散射和吸收系数与薄膜结构之间的关系。
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来源期刊
CiteScore
1.80
自引率
22.20%
发文量
43
审稿时长
15 weeks
期刊最新文献
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