Study on Precursor Distribution of a No-inner-wall Deposition Atmospheric Pressure Plasma Jet Used for Thin Film Deposition

IF 2.6 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL Plasma Chemistry and Plasma Processing Pub Date : 2024-02-11 DOI:10.1007/s11090-024-10448-w

Tao He, Zhixin Qian, Qin Wang, Yu Zhang, Haoze Wang, Jing Zhang, Xiang Fei, Yu Xu

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Abstract

An atmospheric pressure jet that effectively prevents inner wall deposition has been developed, and its precursor distribution and thin-film deposition characteristics have been studied. The laser scattering and fluid simulation results show that the precursor (C₄H₁₀Zn) flow out of the eight holes of the central electrode and diffuse into the discharge region. Under the action of a discharge gas (Ar) of 2 slm is blown out of the plasma jet device, and will not diffuse to the inner wall of the plasma jet device. The optical photographs of the discharge show that the site of the monomer cleavage is about 1 mm closest to the inner wall of the jet device. With optical emission spectra (OES), a large number of characteristic emission peaks of Zn and CH were detected. The pattern of the deposited film closely resembles the diffusion pattern of the precursor within the plasma jet apparatus. By investigating deposited films in different regions, the influence of precursor distribution on film morphology and composition has been studied. XPS detected films near (black film) and far (white film) from the central region, and the results showed that films near the central region contained more organic components. This plasma device offers a stable plasma plume for thin film deposition and nanoparticle preparation.

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用于薄膜沉积的无内壁沉积常压等离子体射流的前驱体分布研究

我们开发了一种能有效防止内壁沉积的常压射流，并对其前驱体分布和薄膜沉积特性进行了研究。激光散射和流体模拟结果表明，前驱体（C4H10Zn）从中央电极的八个孔中流出并扩散到放电区。在放电气体（Ar）的作用下，2 slm 的气体被吹出等离子体喷射装置，不会扩散到等离子体喷射装置的内壁。放电的光学照片显示，单体裂解的位置距离喷射装置内壁约 1 毫米。通过光学发射光谱（OES），检测到大量 Zn 和 CH 的特征发射峰。沉积薄膜的形态与等离子喷射装置内前驱体的扩散形态非常相似。通过调查不同区域的沉积薄膜，研究了前驱体分布对薄膜形态和成分的影响。XPS 检测了靠近中心区域（黑膜）和远离中心区域（白膜）的薄膜，结果表明靠近中心区域的薄膜含有更多的有机成分。该等离子体装置为薄膜沉积和纳米粒子制备提供了稳定的等离子体羽流。

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.