Advances in scalable plasmonic nanostructures: towards phase-engineered interference lithography for complex 2D lattices

IF 2.2 4区 化学 Q3 CHEMISTRY, PHYSICAL Colloid and Polymer Science Pub Date : 2024-06-21 DOI:10.1007/s00396-024-05276-5
Swagato Sarkar, Olha Aftenieva, Tobias A.F. König
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Abstract

Scalable plasmonic nanostructures are reliably created by controlled drying of a colloidal suspension on prefabricated templates. More complex structures such as hexagonal, Lieb, honeycomb, or Kagome lattices are required to develop specific band structures. Laser inference lithography (LIL) combined with template-assisted self-assembly (TASA) offers fabricating nanostructures reliably with high precision over large areas. Less well-known is that more complex 2D lattice geometries are possible with phase-engineered interference lithography (PEIL). Using optical design and electromagnetic simulations, we numerically propose the potential of PEIL towards realizing complex structures of various periodicities. We present the advantages of these structures using dispersion diagrams showing Dirac cones for honeycomb lattices, which are known from the electronic band structure of graphene or an optical band gap for Kagome lattices at an oblique angle. Further, based on our simulated optical characterization of the proposed 2D plasmonic gratings supporting surface lattice resonances (SLR), it is possible to achieve an exceptionally small linewidth of 1 nm for hexagonal and honeycomb gratings. Consequently, we discuss the benefits of refractive index sensors, where we found a ten times higher sensitivity for such complex plasmonic lattices. Overall, we propose and estimate the potential of PEIL for colloidal plasmonics to be realized using the conventional TASA method.

Graphical Abstract

The König research group describes the innovative process of producing complex 2D plasmonic lattices by phase-engineered interference lithography (PEIL). The proposed PEIL approach provides the foundation for implementing future template-assisted self-assembly (TASA) using this method. The optical properties of these gratings, such as narrow line widths and a high figure of merit (FOM), are emphasized, which are crucial to advancing the colloidal plasmonics and nanostructuring field.

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可扩展质子纳米结构的进展:实现复杂二维晶格的相位工程干涉光刻技术
通过控制预制模板上胶体悬浮液的干燥,可以可靠地制造出可扩展的质子纳米结构。要开发特定的带状结构,需要更复杂的结构,如六边形、利布、蜂巢或卡戈米晶格。激光干涉光刻技术(LIL)与模板辅助自组装技术(TASA)相结合,可大面积、高精度、可靠地制造纳米结构。较少为人所知的是,相位工程干涉光刻技术(PEIL)可实现更复杂的二维晶格几何形状。利用光学设计和电磁模拟,我们从数值上提出了 PEIL 在实现各种周期性复杂结构方面的潜力。我们利用色散图展示了这些结构的优势,图中显示了蜂窝状晶格的狄拉克锥,这是从石墨烯的电子带结构或斜角卡戈米晶格的光带隙中得知的。此外,根据我们对支持表面晶格共振(SLR)的拟议二维等离子光栅进行的模拟光学表征,六边形和蜂巢光栅的线宽可达到 1 纳米的超小线宽。因此,我们讨论了折射率传感器的优势,我们发现这种复杂的等离子体晶格的灵敏度要高出十倍。总之,我们提出并估计了PEIL在胶体等离子体学方面的潜力,这种潜力可以用传统的TASA方法来实现。图解摘要柯尼希研究小组介绍了通过相位工程干涉光刻(PEIL)制作复杂二维等离子体晶格的创新工艺。所提出的相位工程干涉光刻(PEIL)方法为未来利用这种方法实现模板辅助自组装(TASA)奠定了基础。研究强调了这些光栅的光学特性,如窄线宽和高优点系数(FOM),这对于推动胶体等离子体学和纳米结构领域的发展至关重要。
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来源期刊
Colloid and Polymer Science
Colloid and Polymer Science 化学-高分子科学
CiteScore
4.60
自引率
4.20%
发文量
111
审稿时长
2.2 months
期刊介绍: Colloid and Polymer Science - a leading international journal of longstanding tradition - is devoted to colloid and polymer science and its interdisciplinary interactions. As such, it responds to a demand which has lost none of its actuality as revealed in the trends of contemporary materials science.
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