Electroluminescence from pure resonant states in hBN-based vertical tunneling junctions

IF 20.6 Q1 OPTICS Light-Science & Applications Pub Date : 2024-07-08 DOI:10.1038/s41377-024-01491-5
Magdalena Grzeszczyk, Kristina Vaklinova, Kenji Watanabe, Takashi Taniguchi, Konstantin S. Novoselov, Maciej Koperski
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Abstract

Defect centers in wide-band-gap crystals have garnered interest for their potential in applications among optoelectronic and sensor technologies. However, defects embedded in highly insulating crystals, like diamond, silicon carbide, or aluminum oxide, have been notoriously difficult to excite electrically due to their large internal resistance. To address this challenge, we realized a new paradigm of exciting defects in vertical tunneling junctions based on carbon centers in hexagonal boron nitride (hBN). The rational design of the devices via van der Waals technology enabled us to raise and control optical processes related to defect-to-band and intradefect electroluminescence. The fundamental understanding of the tunneling events was based on the transfer of the electronic wave function amplitude between resonant defect states in hBN to the metallic state in graphene, which leads to dramatic changes in the characteristics of electrons due to different band structures of constituent materials. In our devices, the decay of electrons via tunneling pathways competed with radiative recombination, resulting in an unprecedented degree of tuneability of carrier dynamics due to the significant sensitivity of the characteristic tunneling times on the thickness and structure of the barrier. This enabled us to achieve a high-efficiency electrical excitation of intradefect transitions, exceeding by several orders of magnitude the efficiency of optical excitation in the sub-band-gap regime. This work represents a significant advancement towards a universal and scalable platform for electrically driven devices utilizing defect centers in wide-band-gap crystals with properties modulated via activation of different tunneling mechanisms at a level of device engineering.

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基于氢溴萘的垂直隧道结中纯谐振态的电致发光
宽带隙晶体中的缺陷中心因其在光电和传感器技术中的应用潜力而备受关注。然而,嵌入高绝缘晶体(如金刚石、碳化硅或氧化铝)中的缺陷因其内阻大而难以电激发。为了应对这一挑战,我们在六方氮化硼(hBN)中以碳中心为基础,在垂直隧道结中实现了激发缺陷的新模式。通过范德华技术对器件进行合理设计,使我们能够提高和控制与缺陷带和缺陷内电致发光相关的光学过程。对隧道事件的基本理解是基于石墨烯中共振缺陷态与金属态之间电子波函数振幅的转移,由于组成材料的带状结构不同,这导致了电子特性的巨大变化。在我们的设备中,电子通过隧穿途径衰减与辐射重组竞争,由于隧穿时间特性对势垒的厚度和结构非常敏感,因此载流子动力学的可调节性达到了前所未有的程度。这使我们能够实现对缺陷内跃迁的高效电激发,其效率比亚带隙制度下的光激发效率高出几个数量级。这项工作标志着我们在利用宽带隙晶体中的缺陷中心实现电驱动器件的通用和可扩展平台方面取得了重大进展。
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来源期刊
Light-Science & Applications
Light-Science & Applications 数理科学, 物理学I, 光学, 凝聚态物性 II :电子结构、电学、磁学和光学性质, 无机非金属材料, 无机非金属类光电信息与功能材料, 工程与材料, 信息科学, 光学和光电子学, 光学和光电子材料, 非线性光学与量子光学
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