A. I. Okhapkin, M. N. Drozdov, P. A. Yunin, S. A. Kraev, D. B. Radishev
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引用次数: 0
Abstract
The influence of methane plasma parameters on the deposition rate and on the content of the hydrogen and the sp3-carbon fraction in hydrogenated diamond-like carbon films (DLC) was investigated. It was shown that the proportion of the sp3-carbon fraction mainly depends on the inductive power and the argon addition to the plasma; the latter also contributes to a decrease of hydrogen in the films.
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Publishes the most important work in semiconductor research in the countries of the former Soviet Union. Covers semiconductor theory, transport phenomena in semiconductors, optics, magnetooptics, and electrooptics of semiconductors, semiconductor lasers and semiconductor surface physics. The journal features an extensive book review section.
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