Spatial Inhomogeneity of Impact-Ionization Switching Process in Power Si Diode

IF 0.6 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Semiconductors Pub Date : 2024-09-17 DOI:10.1134/s1063782624050117
S. K. Lyubutin, V. E. Patrakov, S. N. Rukin, B. G. Slovikovsky, S. N. Tsyranov
{"title":"Spatial Inhomogeneity of Impact-Ionization Switching Process in Power Si Diode","authors":"S. K. Lyubutin, V. E. Patrakov, S. N. Rukin, B. G. Slovikovsky, S. N. Tsyranov","doi":"10.1134/s1063782624050117","DOIUrl":null,"url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>Voltage drop process in power Si diode switched to a conducting state by an impact-ionization wave, which is excited by overvoltage pulse with a subnanosecond rise time, has been investigated. In experiments, a reverse voltage pulse was applied to a diode with a diameter of 6 mm without preliminary reverse bias, which provided the average rate of voltage rise across the diode <i>dU</i>/<i>dt</i> in the range of 1–10 kV/ns. Numerical simulations showed that calculated and experimentally observed voltage waveforms are in good quantitative agreement in the case when an active area of the structure <i>S</i><sub><i>a</i></sub>, through which a switching current flows, increases with <i>dU</i>/<i>dt</i> value increasing. It was shown that at <i>dU</i>/<i>dt &lt;</i> 2 kV/ns the active area tends to zero, and at <i>dU</i>/<i>dt &gt;</i> 10 kV/ns it approaches the total area of the structure. Comparison with the results of similar studies shows that the increase in the active area of the structure with the increase in the <i>S</i><sub><i>a</i></sub> value does not depend on the material of the structure (silicon and gallium arsenide), the number of layers in the semiconductor structure (diodes and thyristors), and also on the value of the initial bias voltage.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":"2 1","pages":""},"PeriodicalIF":0.6000,"publicationDate":"2024-09-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Semiconductors","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1134/s1063782624050117","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
引用次数: 0

Abstract

Voltage drop process in power Si diode switched to a conducting state by an impact-ionization wave, which is excited by overvoltage pulse with a subnanosecond rise time, has been investigated. In experiments, a reverse voltage pulse was applied to a diode with a diameter of 6 mm without preliminary reverse bias, which provided the average rate of voltage rise across the diode dU/dt in the range of 1–10 kV/ns. Numerical simulations showed that calculated and experimentally observed voltage waveforms are in good quantitative agreement in the case when an active area of the structure Sa, through which a switching current flows, increases with dU/dt value increasing. It was shown that at dU/dt < 2 kV/ns the active area tends to zero, and at dU/dt > 10 kV/ns it approaches the total area of the structure. Comparison with the results of similar studies shows that the increase in the active area of the structure with the increase in the Sa value does not depend on the material of the structure (silicon and gallium arsenide), the number of layers in the semiconductor structure (diodes and thyristors), and also on the value of the initial bias voltage.

Abstract Image

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
功率硅二极管冲击电离切换过程的空间不均匀性
摘要 研究了由亚纳秒级上升时间的过压脉冲激发的冲击电离波将功率硅二极管切换到导电状态时的压降过程。在实验中,对一个直径为 6 毫米的二极管施加了一个反向电压脉冲,而没有进行初步的反向偏压,这样二极管上的平均电压上升率 dU/dt 为 1-10 kV/ns。数值模拟显示,当开关电流流经的结构有源区 Sa 随 dU/dt 值的增加而增大时,计算得出的电压波形与实验观察到的电压波形在数量上非常吻合。结果表明,在 dU/dt < 2 kV/ns 时,有功面积趋于零,而在 dU/dt > 10 kV/ns 时,有功面积接近结构的总面积。与类似研究结果的比较表明,随着 Sa 值的增加,结构有功面积的增加并不取决于结构的材料(硅和砷化镓)、半导体结构的层数(二极管和晶闸管)以及初始偏置电压的值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Semiconductors
Semiconductors 物理-物理:凝聚态物理
CiteScore
1.50
自引率
28.60%
发文量
131
审稿时长
3-6 weeks
期刊介绍: Publishes the most important work in semiconductor research in the countries of the former Soviet Union. Covers semiconductor theory, transport phenomena in semiconductors, optics, magnetooptics, and electrooptics of semiconductors, semiconductor lasers and semiconductor surface physics. The journal features an extensive book review section.
期刊最新文献
Luminescence in p–i–n Structures with Compensated Quantum Wells Structure and Self-Modulation Features of the Superradiant States in Asymmetric Fabry–Perot Cavity Mechanisms of Optical Gain in Heavily Doped AlxGa1 – xN:Si Structures (x = 0.56–1) Spatial Inhomogeneity of Impact-Ionization Switching Process in Power Si Diode Effect of Electric Field on Excitons in a Quantum Well under Additional Optical Excitation
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1