Graphene oxide-based bioinspired neuromorphic transistors with artificial synaptic plasticity

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2024-10-29 DOI:10.1016/j.mssp.2024.109053
Xinru Meng , Gexun Qin , Yanmei Sun
{"title":"Graphene oxide-based bioinspired neuromorphic transistors with artificial synaptic plasticity","authors":"Xinru Meng ,&nbsp;Gexun Qin ,&nbsp;Yanmei Sun","doi":"10.1016/j.mssp.2024.109053","DOIUrl":null,"url":null,"abstract":"<div><div>The explosive growth of information and the emergence of artificial intelligence have sparked significant interest in brain-like computing devices due to their unique properties in today's society. Transistor-based three-terminal artificial synaptic devices are anticipated to overcome the limitations of current von Neumann architectures in the realm of neural computing. In this study, we propose a graphene oxide synaptic transistor that demonstrates pronounced bipolar characteristics and exhibits a low threshold voltage of −0.84 V in p-type devices. The device demonstrates neurosynaptic behavior, providing evidence for the presence of excitatory postsynaptic current and its dependence on pulse amplitude and width. Furthermore, successful simulations have also been conducted to model paired-pulse facilitation and depression. The spike voltage-dependent plasticity was observed, and the device exhibited favorable repeatability in terms of short-term plasticity, encompassing both short-term potentiation and short-term depression. The present study showcases the viability of synaptic transistors based on graphene oxide, thereby opening up new avenues in the realm of neural computing.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"186 ","pages":"Article 109053"},"PeriodicalIF":4.2000,"publicationDate":"2024-10-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800124009491","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

The explosive growth of information and the emergence of artificial intelligence have sparked significant interest in brain-like computing devices due to their unique properties in today's society. Transistor-based three-terminal artificial synaptic devices are anticipated to overcome the limitations of current von Neumann architectures in the realm of neural computing. In this study, we propose a graphene oxide synaptic transistor that demonstrates pronounced bipolar characteristics and exhibits a low threshold voltage of −0.84 V in p-type devices. The device demonstrates neurosynaptic behavior, providing evidence for the presence of excitatory postsynaptic current and its dependence on pulse amplitude and width. Furthermore, successful simulations have also been conducted to model paired-pulse facilitation and depression. The spike voltage-dependent plasticity was observed, and the device exhibited favorable repeatability in terms of short-term plasticity, encompassing both short-term potentiation and short-term depression. The present study showcases the viability of synaptic transistors based on graphene oxide, thereby opening up new avenues in the realm of neural computing.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
基于氧化石墨烯的具有人工突触可塑性的生物启发神经形态晶体管
当今社会,信息的爆炸式增长和人工智能的出现引发了人们对类脑计算设备的浓厚兴趣,因为它们具有独特的特性。基于晶体管的三端人工突触设备有望在神经计算领域克服当前冯-诺依曼架构的局限性。在这项研究中,我们提出了一种氧化石墨烯突触晶体管,它具有明显的双极特性,在 p 型器件中的阈值电压低至 -0.84 V。该器件展示了神经突触行为,为兴奋性突触后电流的存在及其对脉冲幅度和宽度的依赖性提供了证据。此外,还成功模拟了成对脉冲促进和抑制模型。研究观察到了尖峰电压依赖性可塑性,该装置在短期可塑性方面表现出良好的可重复性,包括短期延时和短期抑制。本研究展示了基于氧化石墨烯的突触晶体管的可行性,从而为神经计算领域开辟了新的途径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
期刊最新文献
Designing ZrO2-blended nanocomposite MIM capacitors for future OFET applications and their characterizations Electrochemically enzyme-free detection of lactic acid in human sweat using magnesium organic framework@carbon nanofiber composite Hydrogen behavior and microstructural evolution in flexible IGZO thin films under stress Bundling effect of semiconductor-enriched single-walled carbon nanotube networks on field-effect transistor performance Dual-function efficient hydrogen evolution reaction electrocatalyst and electrode material for supercapacitors based on ternary composite FeS2/Fe2O3/MoS2 nanostructures
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1