{"title":"Experimental study on the multiscale surface morphology of femtosecond laser polishing of silicon carbide ceramics based on inclination angle effect","authors":"Jianbo Chen , Xiaoxiao Chen , Xuanhua Zhang , Yuhang Zhou , Chengnuo Yi , Wenwu Zhang","doi":"10.1016/j.optlastec.2024.111978","DOIUrl":null,"url":null,"abstract":"<div><div>In this paper, an infrared femtosecond laser was used to polish silicon carbide ceramics at large incidence angles. For silicon carbide ceramics with different initial roughness surfaces, the improvement mechanism of laser incident angle on polishing surface quality was systematically analyzed. The effects of other process factors during laser polishing, including spot overlap rate, laser power, and scanning times, on the polishing quality when processing with a large incident angle was investigated. The results indicate that, compared to a vertically incident laser, laser polishing at large incident angles significantly enhances surface roughness. During the polishing process, the laser first removes the higher convex structures on the surface, which helps level peaks to obtain a smooth material surface. Additionally, at an incident angle of 80°, the surface roughness of the polished surface gradually decreases with the increase of the spot overlap rate in the X direction and the Y direction. The roughness only increases when the X-direction overlap rate is 95 %. As single pulse energy increases, the roughness of the polished surface shows a trend of initially increasing and then decreasing. With the increase in laser repetition frequency, the roughness of the polished surface shows a general trend of slow decrease. As the scanning times increase, the roughness of the polished surface generally exhibits a trend of initially decreasing and then increasing. Throughout the experimental process, when the laser incidence angle was set at 80°, the pulse energy at 85 μJ, the overlap rate in the X direction at 90 %, the overlap rate in the Y direction at 95 %, the laser repetition rate at 35 kHz, and the scanning times at 6, the surface roughness of the silicon carbide ceramic reached a minimum of 0.74 μm with the 1000 × magnification.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"181 ","pages":"Article 111978"},"PeriodicalIF":4.6000,"publicationDate":"2024-10-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optics and Laser Technology","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0030399224014361","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"OPTICS","Score":null,"Total":0}
引用次数: 0
Abstract
In this paper, an infrared femtosecond laser was used to polish silicon carbide ceramics at large incidence angles. For silicon carbide ceramics with different initial roughness surfaces, the improvement mechanism of laser incident angle on polishing surface quality was systematically analyzed. The effects of other process factors during laser polishing, including spot overlap rate, laser power, and scanning times, on the polishing quality when processing with a large incident angle was investigated. The results indicate that, compared to a vertically incident laser, laser polishing at large incident angles significantly enhances surface roughness. During the polishing process, the laser first removes the higher convex structures on the surface, which helps level peaks to obtain a smooth material surface. Additionally, at an incident angle of 80°, the surface roughness of the polished surface gradually decreases with the increase of the spot overlap rate in the X direction and the Y direction. The roughness only increases when the X-direction overlap rate is 95 %. As single pulse energy increases, the roughness of the polished surface shows a trend of initially increasing and then decreasing. With the increase in laser repetition frequency, the roughness of the polished surface shows a general trend of slow decrease. As the scanning times increase, the roughness of the polished surface generally exhibits a trend of initially decreasing and then increasing. Throughout the experimental process, when the laser incidence angle was set at 80°, the pulse energy at 85 μJ, the overlap rate in the X direction at 90 %, the overlap rate in the Y direction at 95 %, the laser repetition rate at 35 kHz, and the scanning times at 6, the surface roughness of the silicon carbide ceramic reached a minimum of 0.74 μm with the 1000 × magnification.
期刊介绍:
Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication.
The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas:
•development in all types of lasers
•developments in optoelectronic devices and photonics
•developments in new photonics and optical concepts
•developments in conventional optics, optical instruments and components
•techniques of optical metrology, including interferometry and optical fibre sensors
•LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow
•applications of lasers to materials processing, optical NDT display (including holography) and optical communication
•research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume)
•developments in optical computing and optical information processing
•developments in new optical materials
•developments in new optical characterization methods and techniques
•developments in quantum optics
•developments in light assisted micro and nanofabrication methods and techniques
•developments in nanophotonics and biophotonics
•developments in imaging processing and systems