Experimental study on the multiscale surface morphology of femtosecond laser polishing of silicon carbide ceramics based on inclination angle effect

IF 4.6 2区 物理与天体物理 Q1 OPTICS Optics and Laser Technology Pub Date : 2024-10-29 DOI:10.1016/j.optlastec.2024.111978
Jianbo Chen , Xiaoxiao Chen , Xuanhua Zhang , Yuhang Zhou , Chengnuo Yi , Wenwu Zhang
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Abstract

In this paper, an infrared femtosecond laser was used to polish silicon carbide ceramics at large incidence angles. For silicon carbide ceramics with different initial roughness surfaces, the improvement mechanism of laser incident angle on polishing surface quality was systematically analyzed. The effects of other process factors during laser polishing, including spot overlap rate, laser power, and scanning times, on the polishing quality when processing with a large incident angle was investigated. The results indicate that, compared to a vertically incident laser, laser polishing at large incident angles significantly enhances surface roughness. During the polishing process, the laser first removes the higher convex structures on the surface, which helps level peaks to obtain a smooth material surface. Additionally, at an incident angle of 80°, the surface roughness of the polished surface gradually decreases with the increase of the spot overlap rate in the X direction and the Y direction. The roughness only increases when the X-direction overlap rate is 95 %. As single pulse energy increases, the roughness of the polished surface shows a trend of initially increasing and then decreasing. With the increase in laser repetition frequency, the roughness of the polished surface shows a general trend of slow decrease. As the scanning times increase, the roughness of the polished surface generally exhibits a trend of initially decreasing and then increasing. Throughout the experimental process, when the laser incidence angle was set at 80°, the pulse energy at 85 μJ, the overlap rate in the X direction at 90 %, the overlap rate in the Y direction at 95 %, the laser repetition rate at 35 kHz, and the scanning times at 6, the surface roughness of the silicon carbide ceramic reached a minimum of 0.74 μm with the 1000 × magnification.
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基于倾角效应的飞秒激光抛光碳化硅陶瓷多尺度表面形貌实验研究
本文采用红外飞秒激光对碳化硅陶瓷进行大入射角抛光。针对不同初始粗糙度表面的碳化硅陶瓷,系统分析了激光入射角对抛光表面质量的改善机理。研究了激光抛光过程中的其他工艺因素(包括光斑重叠率、激光功率和扫描时间)对大入射角加工时抛光质量的影响。结果表明,与垂直入射激光相比,大入射角激光抛光能显著提高表面粗糙度。在抛光过程中,激光首先会去除表面较高的凸起结构,这有助于平整峰值,从而获得光滑的材料表面。此外,在入射角为 80° 时,抛光表面的粗糙度会随着 X 方向和 Y 方向光斑重叠率的增加而逐渐降低。只有当 X 方向重叠率为 95% 时,粗糙度才会增加。随着单脉冲能量的增加,抛光表面的粗糙度呈现先增加后减小的趋势。随着激光重复频率的增加,抛光表面的粗糙度总体上呈缓慢下降趋势。随着扫描时间的增加,抛光表面的粗糙度总体上呈现出先减小后增大的趋势。在整个实验过程中,当激光入射角设定为 80°,脉冲能量为 85 μJ,X 方向重叠率为 90%,Y 方向重叠率为 95%,激光重复频率为 35 kHz,扫描次数为 6 次时,碳化硅陶瓷的表面粗糙度在 1000 × 放大倍率下达到最小值 0.74 μm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
8.50
自引率
10.00%
发文量
1060
审稿时长
3.4 months
期刊介绍: Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems
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