Mitigating interface damping of metal adhesion layers of nanostructures through bright-dark plasmonic mode coupling

IF 3.5 2区 物理与天体物理 Q2 PHYSICS, APPLIED Applied Physics Letters Pub Date : 2024-11-06 DOI:10.1063/5.0225598
Lun Wang, Boyu Ji, Yang Xu, Peng Lang, Qi Shao, Siyuan Peng, Ju Yang, Zhenlong Zhao, Xiaowei Song, Jingquan Lin
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Abstract

Metal (such as Cr, Ti, etc.) adhesion layers, which are generally used to prevent nanostructures from falling off during electron beam lithography processes, will introduce interface damping, decrease the near-field enhancement, and shorten the dephasing time of localized surface plasmons (LSP). Maintaining metal adhesion layers while alleviating the induced interface damping in nanostructures is crucial for high-performance sensing, surface-enhanced Raman scattering elements, plasmon-based photocathodes, and plasmon-mediated catalysis. Here, we experimentally demonstrated that the mitigation of interface damping of metal adhesion layers can be achieved through the coupling between the bright and dark plasmonic modes of gold nanorods. We attribute the mitigation to stronger confinement across the plasmon energy, which effectively reduces the proportion of plasmon energy injected into the Cr adhesive layers. Compared to weak coupling, the non-radiative damping of plasmonic modes 1 and 2 is reduced by approximately 74% and 85%, respectively, under strong coupling conditions. The experimental results are supported by finite-difference time-domain simulations and are well explained by the calculated interaction potential for different gap sizes. This research will further benefit applications where low interface damping is required, such as the construction of low-threshold nanolasers and ultrasensitive sensing systems.
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通过明暗质子模式耦合缓解纳米结构金属粘附层的界面阻尼
金属(如铬、钛等)附着层通常用于防止纳米结构在电子束光刻过程中脱落,但会引入界面阻尼,降低近场增强效果,缩短局部表面等离子体(LSP)的去相时间。在减轻纳米结构中诱导的界面阻尼的同时保持金属粘附层,对于高性能传感、表面增强拉曼散射元件、基于等离子体的光电阴极和等离子体介导的催化过程至关重要。在这里,我们通过实验证明,通过金纳米棒的明暗质子模式之间的耦合,可以减轻金属粘附层的界面阻尼。我们将这种缓解归因于等离子体能量的更强限制,这有效降低了注入铬粘合层的等离子体能量比例。与弱耦合相比,在强耦合条件下,质子模式 1 和 2 的非辐射阻尼分别降低了约 74% 和 85%。实验结果得到了有限差分时域仿真的支持,并很好地解释了不同间隙大小的相互作用势的计算结果。这项研究将进一步惠及需要低界面阻尼的应用,如构建低阈值纳米激光器和超灵敏传感系统。
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来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
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