Unveiling the abnormal response behavior of AlGaN-based high electron mobility transistors (HEMTs) under ultraviolet light illumination

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2024-11-19 DOI:10.1016/j.mssp.2024.109134
Mukta Sharma , Chia-Lung Tsai , S.N. Manjunatha , Yu-Li Hsieh , Atanu Das , Kuan-Ying Lee , Sun-Chien Ko , Shiang-Fu Huang , Liann-Be Chang , Meng-Chyi Wu
{"title":"Unveiling the abnormal response behavior of AlGaN-based high electron mobility transistors (HEMTs) under ultraviolet light illumination","authors":"Mukta Sharma ,&nbsp;Chia-Lung Tsai ,&nbsp;S.N. Manjunatha ,&nbsp;Yu-Li Hsieh ,&nbsp;Atanu Das ,&nbsp;Kuan-Ying Lee ,&nbsp;Sun-Chien Ko ,&nbsp;Shiang-Fu Huang ,&nbsp;Liann-Be Chang ,&nbsp;Meng-Chyi Wu","doi":"10.1016/j.mssp.2024.109134","DOIUrl":null,"url":null,"abstract":"<div><div>This study examines the dual functionality of AlGaN/GaN HEMTs as both power transistors and UV photodetectors, motivated by manipulating the bias dependent photoresponse and to perform both functions using AlGaN/GaN HEMT configuration seamlessly. The fabricated HEMTs achieve good electrical performance, with a maximum drain current I<sub>DS</sub> of 547 mA/mm and an ON-to-OFF current ratio (I<sub>ON</sub>/I<sub>OFF</sub>) of 1.2 × 10⁷, with a threshold voltage of −3.9 V. The device demonstrated a peak responsivity of 758.4 A/W at 360 nm with an optical gain of 2617 under forward bias. When biased between −4.6 V &lt; V<sub>GS</sub> &lt; V<sub>th</sub> and V<sub>DS</sub> = +3 V, UV illumination significantly increases the 2DEG channel conductivity, resulting in enhanced electron transport and high responsivity. However, as V<sub>GS</sub> increases, dark current rises, limiting the gain improvement. Additionally, the proposed AlGaN HEMTs showed a UV sensing performance with a linear dynamic range (LDR) of 65.4 dB, indicating potential for UV detection applications. Furthermore, these devices can also operate in reverse conduction (third quadrant), achieving 220.7 A/W when V<sub>DS</sub> &lt; 0 V and V<sub>GS</sub> + V<sub>SD</sub> &gt; V<sub>th</sub>. Applying a higher drain-source voltage further boosts responsivity by strengthening the lateral electric field, but only if dark current remains low. Finally, the HEMTs detect optical pulses at 550 Hz with response times of 641 μs and 776 μs (τ<sub>r</sub>/τ<sub>f</sub>). These capabilities allow the device to function as both a power signal driver and an optical detector without structural modifications, making it a versatile option for multifunctional applications.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"187 ","pages":"Article 109134"},"PeriodicalIF":4.2000,"publicationDate":"2024-11-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800124010308","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

This study examines the dual functionality of AlGaN/GaN HEMTs as both power transistors and UV photodetectors, motivated by manipulating the bias dependent photoresponse and to perform both functions using AlGaN/GaN HEMT configuration seamlessly. The fabricated HEMTs achieve good electrical performance, with a maximum drain current IDS of 547 mA/mm and an ON-to-OFF current ratio (ION/IOFF) of 1.2 × 10⁷, with a threshold voltage of −3.9 V. The device demonstrated a peak responsivity of 758.4 A/W at 360 nm with an optical gain of 2617 under forward bias. When biased between −4.6 V < VGS < Vth and VDS = +3 V, UV illumination significantly increases the 2DEG channel conductivity, resulting in enhanced electron transport and high responsivity. However, as VGS increases, dark current rises, limiting the gain improvement. Additionally, the proposed AlGaN HEMTs showed a UV sensing performance with a linear dynamic range (LDR) of 65.4 dB, indicating potential for UV detection applications. Furthermore, these devices can also operate in reverse conduction (third quadrant), achieving 220.7 A/W when VDS < 0 V and VGS + VSD > Vth. Applying a higher drain-source voltage further boosts responsivity by strengthening the lateral electric field, but only if dark current remains low. Finally, the HEMTs detect optical pulses at 550 Hz with response times of 641 μs and 776 μs (τrf). These capabilities allow the device to function as both a power signal driver and an optical detector without structural modifications, making it a versatile option for multifunctional applications.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
揭示氮化铝基高电子迁移率晶体管 (HEMT) 在紫外线照射下的异常响应行为
本研究探讨了 AlGaN/GaN HEMT 作为功率晶体管和紫外光检测器的双重功能,其动机是操纵与偏压相关的光响应,并利用 AlGaN/GaN HEMT 配置无缝地实现这两种功能。所制造的 HEMT 具有良好的电气性能,最大漏极电流 IDS 为 547 mA/mm,导通与关断电流比(ION/IOFF)为 1.2 × 10⁷,阈值电压为 -3.9 V。当偏压介于 -4.6 V < VGS < Vth 和 VDS = +3 V 之间时,紫外线照射会显著提高 2DEG 沟道电导率,从而增强电子传输和提高响应率。然而,随着 VGS 的增加,暗电流也会上升,从而限制了增益的提高。此外,所提出的 AlGaN HEMT 还具有紫外线传感性能,线性动态范围 (LDR) 达到 65.4 dB,显示出紫外线检测应用的潜力。此外,这些器件还能在反向传导(第三象限)情况下工作,在 VDS < 0 V 和 VGS + VSD > Vth 时达到 220.7 A/W 的功率。通过加强横向电场,施加更高的漏极-源极电压可进一步提高响应速度,但前提是暗电流保持在较低水平。最后,HEMT 以 550 Hz 的频率检测光脉冲,响应时间分别为 641 μs 和 776 μs (τr/τf)。这些性能使该器件无需结构改动即可同时用作功率信号驱动器和光学探测器,成为多功能应用的多用途选择。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
期刊最新文献
Designing ZrO2-blended nanocomposite MIM capacitors for future OFET applications and their characterizations Electrochemically enzyme-free detection of lactic acid in human sweat using magnesium organic framework@carbon nanofiber composite Hydrogen behavior and microstructural evolution in flexible IGZO thin films under stress Bundling effect of semiconductor-enriched single-walled carbon nanotube networks on field-effect transistor performance Dual-function efficient hydrogen evolution reaction electrocatalyst and electrode material for supercapacitors based on ternary composite FeS2/Fe2O3/MoS2 nanostructures
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1