Sliding ferroelectricity-induced triple barrier modulation in van der Waals boron arsenide tunnel junctions

Abstract

To develop low-power, miniature, nonvolatile memory resistor integrated devices for in-memory computing technologies, the exploration of atomic-scale ferroelectric channel semiconductor devices is necessary. We theoretically designed tunnel junction devices based on two-dimensional ferroelectric semiconductors, with two-dimensional metal TaSe2 used as the top electrode and van der Waals bilayer boron arsenide (BAs) as the ferroelectric semiconductor channel, aiming to achieve high-performance, low-power, two-dimensional ferroelectric memory resistors. Our findings demonstrate that the bilayer BAs, upon contact with metal electrodes, can achieve two stable and switchable ferroelectric states. Interlayer relative sliding enables stable and alternating two-dimensional ferroelectric domains, altering the types of triple potential barriers at interfaces from Schottky contacts to Ohmic contacts. Thus, under the modulation of the “triple barrier” mechanism, control over channel carrier switching is achieved, resulting in a tunneling electroresistance of 104%. Additionally, non-equilibrium Green's function results indicate nonlinear changes in the I–V curve when switching between the two stable ferroelectric states, highlighting the multi-resistive state nature of channel resistance. Our research underscores the potential of sliding ferroelectric tunnel junctions in integrating nonvolatile storage and computing units, emphasizing their innovative applications in in-memory computing technologies.