The structural, optical, topographical, and H2 sensing characteristics of a Zn-doped Fe2O3 thin layer deposited via DC & RF magnetron co-sputtering method

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2025-01-08 DOI:10.1007/s10854-024-14166-z
Günay Merhan Muğlu, Volkan Şenay, Sevda Saritaş, Maryam Abdolahpour Salari, Mutlu Kundakçi
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Abstract

In this study, a Zn-doped iron oxide layer was deposited onto a microscope slide using the magnetron co-sputtering technique with direct current (DC) and radio frequency (RF) sources. We comprehensively characterized the resulting Zn-doped Fe2O3 thin layer, employing techniques such as XRD, Raman spectroscopy, UV–VIS spectrophotometry, SEM, EDX, & AFM. XRD examination showed the nanocrystalline structure in the thin layer under investigation. Based on recorded absorption data, the band gap energy value calculation resulted in a value of 2.23 eV for the thin film. Raman spectroscopy identified peaks possessing Raman shifts from 100 to 1400 cm−1. SEM investigation illustrated a consistently uniform thin film surface characteristic throughout the substrate. Additionally, the AFM study disclosed a small RMS roughness value, indicative of an unrough surface for the Zn: Fe2O3 thin layer. The Fe2O3 thin film doped with Zn employing a 30 W DC voltage demonstrated effective hydrogen sensing capability at 300 °C, achieving notable response and recovery time. This work presents a novel application of Zn-doped Fe2O3 thin films as highly sensitive and stable hydrogen sensors, tailored for high-temperature environments. The unique combination of nanocrystalline structure and Zn doping optimizes the material’s electronic properties, enhancing its responsiveness to hydrogen gas. This approach offers a scalable, cost-effective pathway for developing advanced sensor technologies suited to environmental monitoring, industrial safety, and hazardous gas detection, making it a valuable addition to the field of gas-sensing materials.

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通过直流和射频磁控共溅射法沉积的掺锌Fe2O3薄层的结构、光学、形貌和H2传感特性
在这项研究中,使用磁控共溅射技术在直流(DC)和射频(RF)源的显微镜载玻片上沉积了掺杂锌的氧化铁层。采用XRD、拉曼光谱、紫外-可见分光光度法、SEM、EDX、&等技术,对所得掺锌Fe2O3薄层进行了全面表征;AFM。XRD检测表明,所研究的薄层具有纳米晶结构。根据记录的吸收数据,计算出薄膜带隙能量值为2.23 eV。拉曼光谱鉴定出具有拉曼位移从100到1400 cm−1的峰。扫描电镜研究表明,在整个基板上具有一致的均匀薄膜表面特征。此外,AFM研究揭示了一个小的RMS粗糙度值,表明Zn: Fe2O3薄层的表面不粗糙。在30 W直流电压下,掺杂Zn的Fe2O3薄膜在300°C下具有有效的氢传感能力,具有显著的响应和恢复时间。这项工作提出了一种新的应用锌掺杂Fe2O3薄膜作为高灵敏度和稳定的氢传感器,为高温环境量身定制。纳米晶结构和锌掺杂的独特结合优化了材料的电子性能,增强了其对氢气的响应性。这种方法为开发适用于环境监测、工业安全和有害气体检测的先进传感器技术提供了一种可扩展的、具有成本效益的途径,使其成为气敏材料领域的宝贵补充。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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