{"title":"Reduction of Graphene Oxide Via Plasma Immersion Ion Implantation","authors":"Kittiya Kosaentor, Chanokporn Chaiwong","doi":"10.1007/s11090-024-10513-4","DOIUrl":null,"url":null,"abstract":"<div><p>Graphene oxide sheets were irradiated with argon and hydrogen plasma in the configuration of plasma immersion ion implantation with a pulsed negative voltage of -5 kV at varying time intervals, ranging from 2 to 8 min. Their characteristics were investigated in terms of surface and structural modification, elemental compositions and bonding, and sheet resistance. The irradiation removed surface irregularities and transformed it into a smoother surface. Raman spectroscopy analysis revealed that the sp<sup>2</sup> network was restored after the radiation. Due to different energy loss mechanisms, hydrogen irradiation resulted in a smaller size of sp<sup>2</sup> domains, while argon radiation led to more structural defects. The XPS results showed that a significant amount of hydroxyl/epoxy groups were removed, and an increase in carboxyl groups was observed after the irradiation. This indicates that some surface reactions, such as hydrogenation and adsorption of molecules from the environment, occurred. Conductive graphene oxide sheets were obtained as the sheet resistance of the irradiated graphene oxide was reduced compared to that of the pristine graphene oxide. This demonstrates that PIII could be a potential technique to reduce graphene oxide.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"45 1","pages":"33 - 47"},"PeriodicalIF":2.6000,"publicationDate":"2024-09-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Chemistry and Plasma Processing","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s11090-024-10513-4","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, CHEMICAL","Score":null,"Total":0}
引用次数: 0
Abstract
Graphene oxide sheets were irradiated with argon and hydrogen plasma in the configuration of plasma immersion ion implantation with a pulsed negative voltage of -5 kV at varying time intervals, ranging from 2 to 8 min. Their characteristics were investigated in terms of surface and structural modification, elemental compositions and bonding, and sheet resistance. The irradiation removed surface irregularities and transformed it into a smoother surface. Raman spectroscopy analysis revealed that the sp2 network was restored after the radiation. Due to different energy loss mechanisms, hydrogen irradiation resulted in a smaller size of sp2 domains, while argon radiation led to more structural defects. The XPS results showed that a significant amount of hydroxyl/epoxy groups were removed, and an increase in carboxyl groups was observed after the irradiation. This indicates that some surface reactions, such as hydrogenation and adsorption of molecules from the environment, occurred. Conductive graphene oxide sheets were obtained as the sheet resistance of the irradiated graphene oxide was reduced compared to that of the pristine graphene oxide. This demonstrates that PIII could be a potential technique to reduce graphene oxide.
期刊介绍：
Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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