How Shallow and Deep Defects Drive Carrier Dynamics in Tin-Iodide Perovskites

IF 24.4 1区 材料科学 Q1 CHEMISTRY, PHYSICAL Advanced Energy Materials Pub Date : 2025-01-23 DOI:10.1002/aenm.202404905
Antonella Treglia, Andrea Olivati, Valentino Romano, Andrea Iudica, Giuseppe Maria Paternò, Isabella Poli, Annamaria Petrozza
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Abstract

Tin-halide perovskites (THP) exhibit complex carrier dynamics due to the interplay between electronic doping and carrier trapping, both of which affect device performance. Evaluating the impact of trap states is challenging because the timescales of photogenerated electron recombination with dopant holes and trapping often overlap. Here, Transient Absorption Spectroscopy (TAS) is used across a broad spectral and temporal range, spanning from visible to near-infrared and from femtoseconds to microseconds, to probe both sub-bandgap and band-edge transitions, while manipulating defect and doping densities via chemical treatments. Focusing on tin triiodide perovskites, the rapid carrier recombination due to high electronic doping density is considered the main source of carrier loss. However, deep electron trap states originated by two distinct type of defects are identified: surface Sn(IV) defects and tin interstitials. Surface Sn(IV) defects play a key role in the loss of photo-generated carriers, but their density can be mitigated by the addition of SnF2, improving carrier lifetimes. Nevertheless, excessive SnF2 promotes the stabilization of tin interstitial traps, highlighting a delicate balance in defect control. Moreover, near-infrared TAS reveals sub-bandgap transitions associated with shallow traps, which contribute to band-edge repopulation within tens of picoseconds. This work disentangles the contributions of doping and trap-mediated processes to the optoelectronic mechanisms in THP, offering insights into defect management for performance optimization.

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浅缺陷和深缺陷如何驱动碘化锡钙钛矿中的载流子动力学
卤化锡钙钛矿(THP)表现出复杂的载流子动力学,这是由于电子掺杂和载流子捕获之间的相互作用,两者都会影响器件性能。评估陷阱状态的影响是具有挑战性的,因为光生电子与掺杂空穴复合和陷阱的时间尺度经常重叠。在这里,瞬态吸收光谱(TAS)在宽光谱和时间范围内使用,从可见光到近红外,从飞秒到微秒,探测亚带隙和带边跃迁,同时通过化学处理操纵缺陷和掺杂密度。以三碘化锡钙钛矿为例,高电子掺杂密度导致的载流子快速复合被认为是载流子损失的主要来源。然而,深电子阱态是由两种不同类型的缺陷引起的:表面Sn(IV)缺陷和锡间隙。表面Sn(IV)缺陷在光生成载流子的损失中起着关键作用,但它们的密度可以通过添加SnF2来减轻,从而提高载流子的寿命。然而,过量的SnF2促进了锡间质陷阱的稳定,突出了缺陷控制的微妙平衡。此外,近红外TAS揭示了与浅层陷阱相关的亚带隙跃迁,这有助于在数十皮秒内实现带边缘的重新种群。这项工作解开了掺杂和陷阱介导过程对THP光电机制的贡献,为性能优化的缺陷管理提供了见解。
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来源期刊
Advanced Energy Materials
Advanced Energy Materials CHEMISTRY, PHYSICAL-ENERGY & FUELS
CiteScore
41.90
自引率
4.00%
发文量
889
审稿时长
1.4 months
期刊介绍: Established in 2011, Advanced Energy Materials is an international, interdisciplinary, English-language journal that focuses on materials used in energy harvesting, conversion, and storage. It is regarded as a top-quality journal alongside Advanced Materials, Advanced Functional Materials, and Small. With a 2022 Impact Factor of 27.8, Advanced Energy Materials is considered a prime source for the best energy-related research. The journal covers a wide range of topics in energy-related research, including organic and inorganic photovoltaics, batteries and supercapacitors, fuel cells, hydrogen generation and storage, thermoelectrics, water splitting and photocatalysis, solar fuels and thermosolar power, magnetocalorics, and piezoelectronics. The readership of Advanced Energy Materials includes materials scientists, chemists, physicists, and engineers in both academia and industry. The journal is indexed in various databases and collections, such as Advanced Technologies & Aerospace Database, FIZ Karlsruhe, INSPEC (IET), Science Citation Index Expanded, Technology Collection, and Web of Science, among others.
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