Contribution of Ti insertion on nano-crystalline rich oxygen vacancy V2O5’s performance for supercapacitor electrodes

IF 2.6 4区 化学 Q3 ELECTROCHEMISTRY Journal of Solid State Electrochemistry Pub Date : 2024-10-04 DOI:10.1007/s10008-024-06084-1
Khaled Faisal Qasim, Samar Abdel-Hamied, M. M. El-Desoky
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Abstract

The sol–gel film method was employed to produce pure and Ti-doped V2O5 in varying concentrations (1, 2, 3, and 4 mol%). The resulting materials were characterized using X-ray diffraction (XRD), scanning electron microscopy with energy dispersive X-ray spectroscopy (SEM–EDX), transmission electron microscopy (TEM), Brunauer–Emmett–Teller (BET) surface area analysis, and X-ray photoelectron spectroscopy (XPS) to assess their crystal structure, morphology, surface characteristics, and elemental composition. XRD results indicated that all samples, whether pure or doped, crystallized in the orthorhombic phase with a preferred orientation along the (101) plane. The introduction of doping reduced the crystallite size, which fell below 10 nm. SEM analysis revealed that the V2O5 appeared as nanosheets. The impact of doping on electrochemical performance was evaluated using galvanostatic charge/discharge (GCD), electrochemical impedance spectroscopy (EIS), and cyclic voltammetry (CV) in a 1 M LiNO3 electrolyte. The electrochemical tests demonstrated surface redox pseudocapacitive behavior with reversible charge/discharge capabilities, and specific capacitance values ranged from 254.6 to 352.3 F/g, depending on the sample composition, as determined by CV. The presence of dopants enhanced the electrochemical performance due to the multiple oxidation states of V and Ti, as well as the presence of oxygen vacancies (VO··). Specifically, the 4% Ti-doped V2O5 exhibited a specific capacitance (Csp) of 352.3 F/g, energy density (Ed) of 43.3 Wh/kg, power density (Pd) of 554.2 W/kg, and maintained 69.1% cycling stability over 10,000 cycles at 1 A/g.

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钛的插入对纳米富氧空位V2O5超级电容器电极性能的影响
采用溶胶-凝胶膜法制备不同浓度(1、2、3、4 mol%)的纯V2O5和掺钛V2O5。利用x射线衍射(XRD)、扫描电子显微镜(SEM-EDX)、透射电子显微镜(TEM)、布鲁诺尔-埃米特-泰勒(BET)表面积分析和x射线光电子能谱(XPS)对所得材料进行了表征,以评估其晶体结构、形貌、表面特征和元素组成。XRD结果表明,所有样品,无论是纯的还是掺杂的,都在沿(101)平面优先取向的正交相中结晶。掺杂的引入使晶体尺寸减小到10 nm以下。SEM分析表明,V2O5以纳米片的形式出现。采用恒流充放电(GCD)、电化学阻抗谱(EIS)和循环伏安法(CV)在1 M LiNO3电解质中评价掺杂对电化学性能的影响。电化学测试表明,表面氧化还原赝电容行为具有可逆的充放电能力,比电容值范围为254.6至352.3 F/g,具体取决于样品成分,由CV确定。掺杂剂的存在由于V和Ti的多重氧化态以及氧空位(VO··)的存在而增强了电化学性能。其中,4% ti掺杂V2O5的比电容(Csp)为352.3 F/g,能量密度(Ed)为43.3 Wh/kg,功率密度(Pd)为554.2 W/kg,在1 a /g下,在10,000次循环中保持69.1%的循环稳定性。
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来源期刊
CiteScore
4.80
自引率
4.00%
发文量
227
审稿时长
4.1 months
期刊介绍: The Journal of Solid State Electrochemistry is devoted to all aspects of solid-state chemistry and solid-state physics in electrochemistry. The Journal of Solid State Electrochemistry publishes papers on all aspects of electrochemistry of solid compounds, including experimental and theoretical, basic and applied work. It equally publishes papers on the thermodynamics and kinetics of electrochemical reactions if at least one actively participating phase is solid. Also of interest are articles on the transport of ions and electrons in solids whenever these processes are relevant to electrochemical reactions and on the use of solid-state electrochemical reactions in the analysis of solids and their surfaces. The journal covers solid-state electrochemistry and focusses on the following fields: mechanisms of solid-state electrochemical reactions, semiconductor electrochemistry, electrochemical batteries, accumulators and fuel cells, electrochemical mineral leaching, galvanic metal plating, electrochemical potential memory devices, solid-state electrochemical sensors, ion and electron transport in solid materials and polymers, electrocatalysis, photoelectrochemistry, corrosion of solid materials, solid-state electroanalysis, electrochemical machining of materials, electrochromism and electrochromic devices, new electrochemical solid-state synthesis. The Journal of Solid State Electrochemistry makes the professional in research and industry aware of this swift progress and its importance for future developments and success in the above-mentioned fields.
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