Study of the influence of phase transformations of the biogenic Hydroxyapatite/Nb2O5 heterostructure on the photodegradation of different dye mixtures under sunlight irradiation

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2025-02-21 DOI:10.1016/j.mssp.2025.109400
M.A.M. Castro , D.F.S. Morais , R.A. Oliveira , M.D. Teodoro , U.C. Silva , F.V. Motta , M.R.D. Bomio
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Abstract

The calcination temperature is responsible for decomposing hydroxyapatite (HAp) and altering the crystalline structure of Nb2O5. In this work, we report the synthesis of a biogenic HAp/Nb2O5 heterostructure via a microwave-assisted hydrothermal method. Marine shell residues were used as a calcium precursor for the synthesis of HAp. Samples without calcination and calcined between 600 and 1200 °C were obtained to observe the influence of phase transformations on the photocatalytic performance. XRD and SEM characterization revealed the formation of calcium niobate crystalline phases at 800 °C and tricalcium phosphate phases at 1000 °C. The presence of these phases promoted textural and spectroscopic changes in the heterostructure. Photocatalytic tests under solar irradiation in different mixtures involving cationic and anionic dyes revealed that the best sample was the one without calcination, as it exhibited fewer deep defects and a larger specific surface area. Moreover, the heterostructure of the mixtures maintained photodegradation stability by at least 78 % after five reuse cycles. Inhibitor tests, EPR analyses and UV light testing indicated that superoxide (•O2), hole (h+) and hydroxyl (OH) are the active radicals and that there is a minimal sensitization influence. After calculation of the conduction and valence bands, a proposed mechanism for the obtained heterostructure indicated that it is of the direct Z scheme type.

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Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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