The performance of laser-induced damage of a 2–4 μm mid-infrared anti-reflective coating based on HfO2/SiO2 materials

IF 3.4 3区物理与天体物理 Q2 INSTRUMENTS & INSTRUMENTATION Infrared Physics & Technology Pub Date : 2025-06-01 Epub Date: 2025-02-17 DOI:10.1016/j.infrared.2025.105771

Qinmin Wang , Kun Wang , Menglei Wang , Lin Wang , Hao Liu , WeiLi Zhang , Dong Li

{"title":"The performance of laser-induced damage of a 2–4 μm mid-infrared anti-reflective coating based on HfO2/SiO2 materials","authors":"Qinmin Wang , Kun Wang , Menglei Wang , Lin Wang , Hao Liu , WeiLi Zhang , Dong Li","doi":"10.1016/j.infrared.2025.105771","DOIUrl":null,"url":null,"abstract":"<div><div>A double-sided anti-reflective coating based on HfO<sub>2</sub>/SiO<sub>2</sub> was fabricated using electron beam evaporation and ion-assisted technology. The electron beam evaporation used metallic Hf as the original film material and the ion-beam-assisted electron-beam evaporation used HfO<sub>2</sub> as the original film material. The SiO<sub>2</sub> film layers were prepared according to the traditional process. The effects of ion-beam assistance on the optical properties of the anti-reflective coating and the laser-induced damage threshold, damage morphology, and size of damage were compared. Additionally, the damage-induced factors in themid-infrared band were analyzed. The results showed that ion-beam assistance can affect the crystal structure, grain size, and interfacial bonding strength of the film layers. The ion-beam-assisted electron-beam evaporation film developed in this study has a lower water absorption state and higher laser-induced damage threshold.</div></div>","PeriodicalId":13549,"journal":{"name":"Infrared Physics & Technology","volume":"147 ","pages":"Article 105771"},"PeriodicalIF":3.4000,"publicationDate":"2025-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Infrared Physics & Technology","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1350449525000647","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2025/2/17 0:00:00","PubModel":"Epub","JCR":"Q2","JCRName":"INSTRUMENTS & INSTRUMENTATION","Score":null,"Total":0}

引用次数: 0

Abstract

A double-sided anti-reflective coating based on HfO₂/SiO₂ was fabricated using electron beam evaporation and ion-assisted technology. The electron beam evaporation used metallic Hf as the original film material and the ion-beam-assisted electron-beam evaporation used HfO₂ as the original film material. The SiO₂ film layers were prepared according to the traditional process. The effects of ion-beam assistance on the optical properties of the anti-reflective coating and the laser-induced damage threshold, damage morphology, and size of damage were compared. Additionally, the damage-induced factors in the mid-infrared band were analyzed. The results showed that ion-beam assistance can affect the crystal structure, grain size, and interfacial bonding strength of the film layers. The ion-beam-assisted electron-beam evaporation film developed in this study has a lower water absorption state and higher laser-induced damage threshold.

查看原文

微信好友朋友圈 QQ好友复制链接

本刊更多论文

研究了基于HfO2/SiO2材料的2-4 μm中红外增透涂层的激光损伤性能

采用电子束蒸发和离子辅助技术制备了HfO2/SiO2双面抗反射涂层。电子束蒸发以金属Hf为原膜材料，离子束辅助电子束蒸发以HfO2为原膜材料。按照传统工艺制备了SiO2薄膜层。比较了离子束辅助对增透膜光学性能的影响以及激光损伤阈值、损伤形态和损伤尺寸的影响。此外，还对中红外波段的损伤诱发因素进行了分析。结果表明，离子束辅助可以影响膜层的晶体结构、晶粒尺寸和界面结合强度。本研究制备的离子束辅助电子束蒸发膜具有较低的吸水态和较高的激光损伤阈值。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文去求助

来源期刊

Infrared Physics & Technology 物理-光学

CiteScore

5.70

自引率

12.10%

发文量

400

审稿时长

67 days

期刊介绍： The Journal covers the entire field of infrared physics and technology: theory, experiment, application, devices and instrumentation. Infrared'' is defined as covering the near, mid and far infrared (terahertz) regions from 0.75um (750nm) to 1mm (300GHz.) Submissions in the 300GHz to 100GHz region may be accepted at the editors discretion if their content is relevant to shorter wavelengths. Submissions must be primarily concerned with and directly relevant to this spectral region. Its core topics can be summarized as the generation, propagation and detection, of infrared radiation; the associated optics, materials and devices; and its use in all fields of science, industry, engineering and medicine. Infrared techniques occur in many different fields, notably spectroscopy and interferometry; material characterization and processing; atmospheric physics, astronomy and space research. Scientific aspects include lasers, quantum optics, quantum electronics, image processing and semiconductor physics. Some important applications are medical diagnostics and treatment, industrial inspection and environmental monitoring.