Prospects and challenges of thin film coating materials and their applications

IF 5.4 3区 化学 Q1 CHEMISTRY, INORGANIC & NUCLEAR Inorganic Chemistry Communications Pub Date : 2025-05-01 Epub Date: 2025-02-18 DOI:10.1016/j.inoche.2025.114117
Md. Abdullah , Md. Mobashir Hosain , Md Mahadi Hassan Parvez , Md Samiul Haque Motayed
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Abstract

Thin film coating materials have become integral to various industries due to their unique physical, chemical, and mechanical properties. This paper provides a comprehensive overview of thin film materials, deposition techniques, applications, and challenges while exploring future prospects. The materials discussed include metallic coatings such as gold, silver, aluminum, and titanium nitride (TiN), valued for their electrical conductivity, reflectivity, and hardness. Oxide materials like silicon dioxide, titanium dioxide, and aluminum oxide play critical roles in electronics, solar cells, and protective applications due to their dielectric properties and wear resistance. Polymeric coatings, including PTFE, PET, and PVDF, offer non-stick, barrier, and weather-resistant capabilities. Composite and hybrid materials, particularly nanocomposites and graphene-based systems, are highlighted for their multifunctionality and potential in advanced electronics and energy storage. Key deposition techniques such as Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), Atomic Layer Deposition (ALD), and the sol–gel process are outlined for their precision and adaptability. Applications range from electronics and semiconductors to optics, energy storage, biomedical devices, and protective coatings. However, challenges such as durability, scalability, environmental concerns, and costs pose significant barriers. Looking ahead, the development of nanostructured, multi-layer, and green thin films presents exciting possibilities for enhancing performance and sustainability. By addressing existing limitations and innovating in material design and deposition methods, thin film technologies are poised to drive advancements in emerging fields, including flexible electronics, renewable energy, and environmentally friendly coatings. This study underscores the critical role of thin films in modern technology and their potential for transformative impact.

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薄膜涂层材料及其应用的前景与挑战
薄膜涂层材料由于其独特的物理、化学和机械性能,已成为各个行业不可或缺的一部分。本文全面概述了薄膜材料、沉积技术、应用和挑战,同时探讨了未来的前景。讨论的材料包括金属涂层,如金、银、铝和氮化钛(TiN),它们的导电性、反射率和硬度都很有价值。氧化物材料,如二氧化硅、二氧化钛和氧化铝,由于其介电性能和耐磨性,在电子、太阳能电池和保护应用中起着至关重要的作用。聚合物涂层,包括PTFE, PET和PVDF,提供不粘,屏障和耐候能力。复合材料和混合材料,特别是纳米复合材料和石墨烯基系统,因其多功能和在先进电子和能源存储方面的潜力而备受关注。概述了物理气相沉积(PVD)、化学气相沉积(CVD)、原子层沉积(ALD)和溶胶-凝胶法等关键沉积技术的精度和适应性。应用范围从电子和半导体到光学、能源存储、生物医学设备和保护涂层。然而,耐久性、可伸缩性、环境问题和成本等挑战构成了重大障碍。展望未来,纳米结构、多层和绿色薄膜的发展为提高性能和可持续性提供了令人兴奋的可能性。通过解决材料设计和沉积方法的现有限制和创新,薄膜技术有望推动新兴领域的进步,包括柔性电子,可再生能源和环保涂料。这项研究强调了薄膜在现代技术中的关键作用及其变革性影响的潜力。
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来源期刊
Inorganic Chemistry Communications
Inorganic Chemistry Communications 化学-无机化学与核化学
CiteScore
5.50
自引率
7.90%
发文量
1013
审稿时长
53 days
期刊介绍: Launched in January 1998, Inorganic Chemistry Communications is an international journal dedicated to the rapid publication of short communications in the major areas of inorganic, organometallic and supramolecular chemistry. Topics include synthetic and reaction chemistry, kinetics and mechanisms of reactions, bioinorganic chemistry, photochemistry and the use of metal and organometallic compounds in stoichiometric and catalytic synthesis or organic compounds.
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