Silicon-based gallium oxide optical waveguide fabricated by MOCVD

IF 3.9 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2025-08-01 Epub Date: 2025-03-06 DOI:10.1016/j.vacuum.2025.114221
Yu Han , Wei Chen , Teng Jiao , Han Yu , Zhao Zhang , Xin Dong , Yuantao Zhang , Baolin Zhang
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Abstract

In this paper, the Ga2O3 films were grown on Si/SiO2 template by MOCVD and the effects of the growth temperature on the film's properties were investigated. The films transitioned from an amorphous phase to a polycrystalline β-Ga2O3 phase as the growth temperature increased. The bonding state of oxygen in the films was investigated. Based on the measured optical parameters of amorphous Ga2O3 films and optical simulation calculation, optical waveguide structures were designed and fabricated. The characteristics of the waveguide were consistent with the design. The 2.5-μm-wide, 310-nm-high Ga2O3 waveguide achieved an optical loss of 12.4 dB/cm at 1550 nm using the truncation method. This study demonstrated that amorphous Ga2O3 films grown by the MOCVD have great potential for waveguide fabrication.
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MOCVD制备的硅基氧化镓光波导
本文采用MOCVD法在Si/SiO2模板上生长Ga2O3薄膜,研究了生长温度对薄膜性能的影响。随着生长温度的升高,膜由非晶相转变为多晶β-Ga2O3相。研究了氧在膜中的成键状态。基于实测的非晶Ga2O3薄膜光学参数和光学模拟计算,设计并制作了光波导结构。该波导的特性与设计一致。采用截断法制备的宽2.5 μm、高310 nm的Ga2O3波导在1550 nm处的光损耗为12.4 dB/cm。该研究表明,MOCVD生长的非晶Ga2O3薄膜在波导制造中具有很大的潜力。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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