Chenyang Jin , Fawei Lin , Bangfa Peng , Linsheng Wei , Zhongqian Ling , Xianyang Zeng , Dingkun Yuan
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引用次数: 0
Abstract
Dielectric barrier discharge is effective for generating reactive species, making it particularly suitable for chemical processes such as ozone synthesis. This study investigates ozone production and nitrogen oxides formation in a micro-hollow surface dielectric barrier discharge reactor driven by nanosecond pulses at atmospheric pressure for the first time. Effects of pulse widths (100–1000 ns) and rise times (50–250 ns) on electrical properties, optical emission spectra, and gas-phase products were analyzed. Longer pulse widths enhanced discharge uniformity, raised rotational temperature, and reduced vibrational temperature, while shorter rise times improved ozone efficiency and electron excitation temperature. The peak ozone generation efficiency (57.45 g/Nm3), under varying pulse width and rise time parameters, was achieved with a 1000 ns pulse width and 50 ns rise time, at an energy input of 156.24 J/L. The optimal flow rate of 1 SLM was found to achieve the maximum ozone generation efficiency of 73.94 g/kWh. Nitrogen oxide measurements showed increased NO2 and N2O concentrations with pulse width, while rise time had minimal impact. These findings provide valuable insights for designing industrial dielectric barrier discharge ozone generators.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.