The influence of total reactor pressure on PECVD growth of carbon nanotubes

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2025-03-10 DOI:10.1016/j.vacuum.2025.114242
Sergey V. Bulyarskiy, Mikhail S. Molodenskiy, Pavel E. L'vov, Alexander A. Pavlov, Yuri V. Anufriev, Yuri P. Shaman, Georgy G. Gusarov, Kirill A. Modestov, Artem V. Sysa, Alexander R. Shevchenko
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Abstract

The paper presents an experimental and theoretical study of PECVD growth of carbon nanotube arrays on silicon planar substrates with iron as a catalyst. It is shown that an increase in the total gas pressure in the reactor causes the plasma temperature to drop, which leads to a decrease in the pyrolysis rate. At low pressures and high pyrolysis rates, a layer of amorphous carbon forms on the surface of the catalyst and carbon nanotubes, which creates a barrier to carbon penetration into the catalyst, slowing down the growth of nanotubes. At high gas pressures, the growth rate of nanotubes is higher, which leads to an increase in the content of defects in them.
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本文介绍了以铁为催化剂在硅平面基底上进行 PECVD 生长碳纳米管阵列的实验和理论研究。研究表明,反应器中气体总压的增加会导致等离子体温度下降,从而降低热解速率。在低压和高热解速率下,催化剂和碳纳米管表面会形成一层无定形碳,从而阻碍碳渗入催化剂,减缓纳米管的生长。在高气体压力下,纳米管的生长速度会更快,从而导致其中的缺陷含量增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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