Silicon Caught Carbon Copying Wolff–Kishner Reduction in Two Dimensional Siloxene Nanosheets

IF 7 2区 材料科学 Q2 CHEMISTRY, PHYSICAL Chemistry of Materials Pub Date : 2025-03-17 DOI:10.1021/acs.chemmater.4c02642
Nav Deepak, Rahul Kumar Das, Dhara Raval, Shobha Shukla, Sumit Saxena
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Abstract

Despite vast potential, silicon chemistry has taken a back foot in the recent past as compared to its counterpart, carbon. Recently, silicon-based inorganic compounds containing silicon and oxygen have attracted significant attention. Of these, one intriguing nanostructure is Siloxene, a 2D oxide of silicon. Its close structural resemblance to 2D carbon compounds provides an opportunity to explore chemistries similar to carbon in silicon. Here, we have investigated the stability and reduction of Si═O bonds in 2D-Siloxene using hydrazine in potassium hydroxide. The reduction of 2D Siloxene shows striking similarity to Wolff–Kishner reduction, which is well-known in carbon chemistry. Specifically, the polarization of the Si═O bond in Siloxene results in charge separation between the silicon and oxygen atoms. This significantly enhances the reactivity of the Si═O bond and renders it susceptible to reduction. Mulliken charge analysis within the framework of density functional theory calculations suggests the electronegative behavior of O atoms, when attached to Si both as Si═O and Si–OH. The electropositive Si atom in Si═O is attacked by hydrazine hydrate, subsequently, when treated with a strong base, typically potassium hydroxide, affects the reduction of the hydrazone. Our study provides strong theoretical and experimental evidence for a reduction mechanism analogous to the Wolff–Kishner reduction, in 2D silicon, enabling developing insights in silicon reduction.

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二维硅氧烷纳米片的硅捕获碳复制Wolff-Kishner还原
尽管有巨大的潜力,但与碳相比,硅化学在最近的一段时间里已经退步了。近年来,含硅和氧的硅基无机化合物引起了人们的极大关注。其中一个有趣的纳米结构是硅烯,一种硅的二维氧化物。它与二维碳化合物的结构相似,为探索与硅中的碳相似的化学物质提供了机会。在这里,我们用氢氧化钾中的肼研究了2d -硅氧烷中Si = O键的稳定性和还原。二维硅氧烷的还原与碳化学中众所周知的Wolff-Kishner还原具有惊人的相似性。具体地说,硅烯中Si = O键的极化导致硅原子和氧原子之间的电荷分离。这显著增强了Si = O键的反应性,使其易于还原。密度泛函理论计算框架内的Mulliken电荷分析表明,当以Si = O和Si - oh的形式连接到Si时,O原子的电负性行为。Si = O中的正电的Si原子被水合肼攻击,随后,当用强碱(通常是氢氧化钾)处理时,影响了腙的还原。我们的研究为二维硅中类似Wolff-Kishner还原的还原机制提供了强有力的理论和实验证据,从而使人们能够深入了解硅还原。
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来源期刊
Chemistry of Materials
Chemistry of Materials 工程技术-材料科学:综合
CiteScore
14.10
自引率
5.80%
发文量
929
审稿时长
1.5 months
期刊介绍: The journal Chemistry of Materials focuses on publishing original research at the intersection of materials science and chemistry. The studies published in the journal involve chemistry as a prominent component and explore topics such as the design, synthesis, characterization, processing, understanding, and application of functional or potentially functional materials. The journal covers various areas of interest, including inorganic and organic solid-state chemistry, nanomaterials, biomaterials, thin films and polymers, and composite/hybrid materials. The journal particularly seeks papers that highlight the creation or development of innovative materials with novel optical, electrical, magnetic, catalytic, or mechanical properties. It is essential that manuscripts on these topics have a primary focus on the chemistry of materials and represent a significant advancement compared to prior research. Before external reviews are sought, submitted manuscripts undergo a review process by a minimum of two editors to ensure their appropriateness for the journal and the presence of sufficient evidence of a significant advance that will be of broad interest to the materials chemistry community.
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