Impact of Gaussian Traps on the Characteristics of L-Shaped Tunnel Field-Effect Transistor

Q3 Engineering Micro and Nanosystems Pub Date : 2023-05-08 DOI:10.2174/1876402915666230508155922
S. K. Sinha, S. Chander, Rekha Chaudhary
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Abstract

Internet of Things (IoT) applications require high-performance TFET devices that can be efficiently integrated with the cyber world and physical world. The impact of introducing Gaussian traps in hetero-junction tunneling-field-effect-transistors (TFET) with an L-shaped gate is presented. The 2-D TCAD study of different characteristics, like input, output characteristics, and noise spectral density with trap and without trap, has been performed. The simulation results showed that in L-shaped TFET (L_TFET), the high on-current of 1.93×10-5 A/µm, low off-current/leakage current of 1.09×10-13 A/µm, and steep sub-threshold slope (SS) of 24 mV/dec without traps and on-current of 8.46×10-6 A/µm, off-current of 2.86×10-11 A/µm, and degraded SS with traps are observed. They also indicated that the presence of traps reduces gate-drain capacitance (Cgd), while gate-source capacitance (Cgs) remains unaffected. In addition, in L_TFET, the drain current noise spectral density (SID) of 7.63 E-21 (A2/Hz) at LF and 2.69 E-26 (A2/Hz) at HF while the noise voltage spectral density (SVG) of 7.33 E-4 (V2/Hz) at LF and 2.59 E-15 (V2/Hz) at HF without traps have been investigated in this study. The inverse dependence of drain current noise spectral density on frequency has been observed to lower the effect of noise at HF. It can be concluded that the proposed L_TFET device is free from ambipolarity conduction and can be well-suited for low-power applications.
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高斯陷阱对l型隧道场效应晶体管特性的影响
物联网(IoT)应用需要能够与网络世界和物理世界高效集成的高性能TFET器件。介绍了引入高斯阱对l型栅异质结隧道场效应晶体管(ttfet)的影响。二维TCAD研究了不同的特征,如输入、输出特性和噪声谱密度,有陷阱和没有陷阱。仿真结果表明,l型TFET (L_TFET)具有高导通电流1.93×10-5 A/µm、低关断电流/漏电流1.09×10-13 A/µm、陡的亚阈值斜率(SS) 24 mV/dec,无陷阱,导通电流8.46×10-6 A/µm,关断电流2.86×10-11 A/µm,有陷阱时SS降低。他们还指出,陷阱的存在降低了栅极-漏极电容(Cgd),而栅极-源电容(Cgs)不受影响。此外,本文还研究了L_TFET在无陷阱的情况下,低频和高频的漏极电流噪声谱密度分别为7.63 E-21 (A2/Hz)和2.69 E-26 (A2/Hz),低频和高频的噪声电压谱密度分别为7.33 E-4 (V2/Hz)和2.59 E-15 (V2/Hz)。漏极电流噪声谱密度与频率呈反比关系,可以降低高频噪声的影响。可以得出结论,所提出的L_TFET器件没有双极性传导,可以很好地适用于低功耗应用。
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来源期刊
Micro and Nanosystems
Micro and Nanosystems Engineering-Building and Construction
CiteScore
1.60
自引率
0.00%
发文量
50
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