Thickness Dependency of Zinc Selenide (ZnSe) Thin Film Deposited By Vacuum Evaporation Method

Md. Abu Sayeed, H. Rouf, Mohd. Rezaul Hasan, K. Hussain
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Abstract

Fabrication of Zinc Selenide (ZnSe) thin film having different thickness has been performed on glass substrate using thermal vacuum evaporation technique by evaporating ZnSe powder and is further characterized by X-ray diffractometer (XRD) and UV-VIS-NIR spectrophotometer. XRD patterns revealed that ZnSe thin film has face centered cubic (fcc) structure with variable miller indices at maximum X-ray intensity as the thickness changes. Substrate temperature is fixed at 290°C and all films are annealed for 60 minutes at 300°C. We have got peak value of intensity in XRD patterns which drops as the thickness of ZnSe thin film reduces. Optical properties like transmittance, refractive index, energy bandgap and reflectance have also been extracted in both simulation and experiment and found promising results. Transmittance in near-infrared region for all the films are greater than 63% in simulation and fewer less in experiment, variable reflectance of (7-31)%, optical bandgap from 2.44 eV to 2.64 eV and fluctuation in refractive index from 2.31 to 2.70 as the film thickness changes. Optical bandgap goes wider for higher thickness films and gets lower as the film thickness decreases.
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真空蒸发法制备硒化锌(ZnSe)薄膜的厚度依赖性
采用热真空蒸发技术,利用蒸发ZnSe粉末在玻璃基板上制备了不同厚度的硒化锌(ZnSe)薄膜,并用x射线衍射仪(XRD)和紫外-可见-近红外分光光度计对其进行了表征。XRD谱图表明,随着厚度的变化,ZnSe薄膜在最大x射线强度下具有面心立方(fcc)结构,米勒指数随厚度的变化而变化。衬底温度固定在290°C,所有薄膜在300°C退火60分钟。得到了随ZnSe薄膜厚度减小而减小的x射线衍射强度峰值。在模拟和实验中也提取了透光率、折射率、能带隙和反射率等光学特性,并取得了令人满意的结果。所有薄膜在近红外区的透射率在模拟中均大于63%,实验中均小于63%,可变反射率为(7 ~ 31)%,光学带隙在2.44 eV ~ 2.64 eV之间,折射率随薄膜厚度变化在2.31 ~ 2.70之间波动。薄膜厚度越大,光带隙越宽,薄膜厚度越小,光带隙越小。
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