Large area SrTiO/sub 3/ thin films for active microwave applications grown by pulsed laser deposition

L. A. Knauss, J. Horwitz, J. Pond, D. Knies, K. Grabowski, D. Chrisey, C. Mueller
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Abstract

Thin films of SrTiO/sub 3/ have been grown by pulsed laser deposition (PLD) on 2" diameter LaAlO/sub 3/ substrates using a technique in which the laser beam is rastered over the radius of a 4 inch diameter target while the substrate is rotated in a radiative blackbody heater. The deposition occurs through a pie shaped opening in the heater. The structure, composition and thickness have been measured using XRD and RBS. The dielectric properties of the film have been measured at 1 MHz utilizing an LCR meter. The results indicate that the films are single phase and [001] oriented. However, film composition, thickness and dielectric properties are not uniform along the radius of the film. The results indicate that the composition nonuniformity is due to off-axis deposition, and correlates with changes in the dielectric properties.
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用脉冲激光沉积法制备大面积SrTiO/ sub3 /有源微波薄膜
利用脉冲激光沉积(PLD)技术,在直径为2英寸的LaAlO/sub - 3/衬底上生长出了SrTiO/sub - 3/薄膜,该技术采用的方法是,当衬底在辐射黑体加热器中旋转时,激光束在直径为4英寸的目标半径上光栅。沉积通过加热器中的饼状开口发生。采用XRD和RBS对其结构、组成和厚度进行了测定。利用LCR计在1兆赫下测量了薄膜的介电性能。结果表明,薄膜为单相取向的[001]薄膜。然而,薄膜的组成、厚度和介电性能沿着薄膜的半径是不均匀的。结果表明,材料组成的不均匀性是由离轴沉积引起的,并与介电性能的变化有关。
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