TCAD analysis of FinFET temperature-dependent variability for analog applications

S. Guerrieri, F. Bonani, G. Ghione
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引用次数: 1

Abstract

The Green’s Function based TCAD device variability analysis is extended to allow for temperature-dependent variability, with negligible overhead in terms of simulation time with respect to fixed temperature simulations. We provide temperature and bias-dependent 3D variability analysis of the DC current for a FinFET structure from the 22 nm node, showing how to predict and mitigate the effects of poor thermal management. Based on the quasi-stationary assumption, preliminary analysis of self-heating effects of a FinFET medium power amplifier is also presented.
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模拟应用中FinFET温度相关变异性的TCAD分析
基于格林函数的TCAD设备可变性分析扩展到允许温度相关的可变性,相对于固定温度模拟,在模拟时间方面的开销可以忽略不计。我们提供了22 nm节点的FinFET结构的直流电流的温度和偏置相关的3D可变性分析,展示了如何预测和减轻热管理不良的影响。在准平稳假设的基础上,对中功率放大器的自热效应进行了初步分析。
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