Contacts realization by rapid thermal annealing in multicrystalline silicon solar cells with special emphasis on metal influence

H. El omari, J. Boyeaux, A. Laugier
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Abstract

To improve the quality of solar cell screen printed contacts, the authors have previously shown the capability to sinter the screen printed contacts by rapid thermal annealing (RTA) instead of commercial sintering; they have also noticed that the commonly used TiO/sub 2/ coating deposited by spray enhances the quality of the contact either with classical annealing or RTA. The aim of the present work is to analyse the metal influence on either front or back contacts realization by RTA on Polix p type multicrystalline silicon subsequently phosphorus diffused. The screen printed contact was replaced by the chosen metal dot obtained by evaporation. The authors have studied: Al/TiO/sub 2/; Ag/Al/TiO/sub 2/; Cu/Al/TiO/sub 2/; Pt/Al/TiO/sub 2/ and Cu/Cr/TiO/sub 2/. The RTA treatments were carried out at various temperatures and annealing time in an Ar ambience. The quality of the contacts are analysed from I-V characteristics, and possible diffusions of metallic species are characterized by SIMS experiments.
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多晶硅太阳电池中快速热退火触点的实现,特别强调金属的影响
为了提高太阳能电池丝网印刷触点的质量,作者之前已经展示了用快速热退火(RTA)代替商业烧结烧结丝网印刷触点的能力;他们还注意到,通过喷涂沉积的常用TiO/sub /涂层可以通过经典退火或RTA提高接触质量。本工作的目的是分析金属对polxp型多晶硅在磷扩散后通过RTA实现前触点或后触点的影响。丝网印刷的触点被蒸发得到的所选金属网点所取代。作者研究了:Al/TiO/sub 2/;Ag / Al / TiO /子2 /;铜/铝/ TiO /子2 /;Pt/Al/TiO/sub 2/和Cu/Cr/TiO/sub 2/。在氩气环境下,在不同温度和退火时间下进行RTA处理。从触点的I-V特性分析了触点的质量,并通过SIMS实验对可能的金属物质扩散进行了表征。
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