S. Kishida, D. Matsuo, T. Ikeda, Y. Setoguchi, Y. Andoh
{"title":"Inductively Coupled Plasma Sputtering System for Oxide Semiconductors for a Large Area Deposition","authors":"S. Kishida, D. Matsuo, T. Ikeda, Y. Setoguchi, Y. Andoh","doi":"10.36463/IDW.2020.0331","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":22504,"journal":{"name":"The Japan Society of Applied Physics","volume":"1998 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2020-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Japan Society of Applied Physics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.36463/IDW.2020.0331","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}