Pub Date : 2020-01-28DOI: 10.1149/ma2020-02683568mtgabs
Tsuyoshi Kawamoto, N. Ishida, N. Kitamura, Y. Idemoto
{"title":"Effect of Mo, W Substitution on Ferroelectric Characteristics, Crystal and Electronic Structure of Bi0.5K0.5TiO3-BiFeO3-KTaO3 Based Ferroelectric Ceramics","authors":"Tsuyoshi Kawamoto, N. Ishida, N. Kitamura, Y. Idemoto","doi":"10.1149/ma2020-02683568mtgabs","DOIUrl":"https://doi.org/10.1149/ma2020-02683568mtgabs","url":null,"abstract":"","PeriodicalId":22504,"journal":{"name":"The Japan Society of Applied Physics","volume":"59 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2020-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86047438","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
S. Kishida, D. Matsuo, T. Ikeda, Y. Setoguchi, Y. Andoh
{"title":"Inductively Coupled Plasma Sputtering System for Oxide Semiconductors for a Large Area Deposition","authors":"S. Kishida, D. Matsuo, T. Ikeda, Y. Setoguchi, Y. Andoh","doi":"10.36463/IDW.2020.0331","DOIUrl":"https://doi.org/10.36463/IDW.2020.0331","url":null,"abstract":"","PeriodicalId":22504,"journal":{"name":"The Japan Society of Applied Physics","volume":"1998 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2020-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80031976","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2020-01-28DOI: 10.1149/ma2020-02261818mtgabs
M. Toguchi, K. Miwa, F. Horikiri, N. Fukuhara, Y. Narita, O. Ichikawa, R. Isono, Takeshi Tanaka, Taketomo Sato
{"title":"Fabrication of Recessed-Gate AlGaN/GaN Hemts Utilizing Contactless Photo-Electrochemical (CL-PEC) Etching","authors":"M. Toguchi, K. Miwa, F. Horikiri, N. Fukuhara, Y. Narita, O. Ichikawa, R. Isono, Takeshi Tanaka, Taketomo Sato","doi":"10.1149/ma2020-02261818mtgabs","DOIUrl":"https://doi.org/10.1149/ma2020-02261818mtgabs","url":null,"abstract":"","PeriodicalId":22504,"journal":{"name":"The Japan Society of Applied Physics","volume":"1 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2020-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78810413","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2020-01-28DOI: 10.21203/RS.3.RS-156385/V1
S. Khanom, N. Hayashi
Zinc ion dissolved in water is attempted to be removed by generating the oxides of zinc using the oxygen gas in DBD plasma system. The removal rate of zinc oxides’ production (ZnO and Zn(OH2)) were measured at different treatment periods by the oxygen plasma penetration in water. The removal rate of the deposit increases initially and then decreases with the treatment period. The maximum removal rate (29%) of zinc from water is achieved at the treatment period of 10 min, where pH is minimum. From FTIR the generation properties of zinc oxide can be recognized. Initially the amount the deposit increases with the ozone treatment period due to production of both ZnO and Zn(OH)2. After that, the production of Zn(OH)42- increases even when the total removal rate of the deposit decreases. Therefore, to remove zinc ion from water forming metal oxide deposit, the penetration amount of the active oxygens to the water must be controlled to keep the pH lower than around 7.5. Because with increasing pH amount of removal rate of ZnO deposit decreases. The pH of the zinc dissolved water treated by ozone depends on both zinc and ozone concentration in water.
{"title":"Removal of Metal Ions from Water Using Oxygen Plasmas","authors":"S. Khanom, N. Hayashi","doi":"10.21203/RS.3.RS-156385/V1","DOIUrl":"https://doi.org/10.21203/RS.3.RS-156385/V1","url":null,"abstract":"\u0000 Zinc ion dissolved in water is attempted to be removed by generating the oxides of zinc using the oxygen gas in DBD plasma system. The removal rate of zinc oxides’ production (ZnO and Zn(OH2)) were measured at different treatment periods by the oxygen plasma penetration in water. The removal rate of the deposit increases initially and then decreases with the treatment period. The maximum removal rate (29%) of zinc from water is achieved at the treatment period of 10 min, where pH is minimum. From FTIR the generation properties of zinc oxide can be recognized. Initially the amount the deposit increases with the ozone treatment period due to production of both ZnO and Zn(OH)2. After that, the production of Zn(OH)42- increases even when the total removal rate of the deposit decreases. Therefore, to remove zinc ion from water forming metal oxide deposit, the penetration amount of the active oxygens to the water must be controlled to keep the pH lower than around 7.5. Because with increasing pH amount of removal rate of ZnO deposit decreases. The pH of the zinc dissolved water treated by ozone depends on both zinc and ozone concentration in water.","PeriodicalId":22504,"journal":{"name":"The Japan Society of Applied Physics","volume":"11 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2020-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82409751","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Koshimizu, Y. Muroya, S. Yamashita, M. Nogami, K. Hitomi, Y. Fujimoto, K. Asai
1Department of Applied Chemistry, Graduate School of Engineering, Tohoku University, 6-6-07 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan 2Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan 3Nuclear Professional School, School of Engineering, The University of Tokyo, 2-22 Shirakata-shirane, Tokai-mura, Naka-gun, Ibaraki 319-1188, Japan 4Department of Quantum Science and Energy Engineering, Graduate School of Engineering, Tohoku University, 6-6-01-2 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
{"title":"Transient Absorption Spectroscopy of TlBr Crystals Using Pulsed Electron Beams","authors":"M. Koshimizu, Y. Muroya, S. Yamashita, M. Nogami, K. Hitomi, Y. Fujimoto, K. Asai","doi":"10.18494/sam.2020.2754","DOIUrl":"https://doi.org/10.18494/sam.2020.2754","url":null,"abstract":"1Department of Applied Chemistry, Graduate School of Engineering, Tohoku University, 6-6-07 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan 2Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan 3Nuclear Professional School, School of Engineering, The University of Tokyo, 2-22 Shirakata-shirane, Tokai-mura, Naka-gun, Ibaraki 319-1188, Japan 4Department of Quantum Science and Energy Engineering, Graduate School of Engineering, Tohoku University, 6-6-01-2 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan","PeriodicalId":22504,"journal":{"name":"The Japan Society of Applied Physics","volume":"14 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2020-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75785805","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2020-01-09DOI: 10.1103/PHYSREVA.102.011501
N. Takemura, M. Takiguchi, H. Sumikura, E. Kuramochi, A. Shinya, M. Notomi
We performed measurements of the photon correlation $[{g}^{(2)}(ensuremath{tau})]$ in driven nonlinear high-$Q$ silicon photonic crystal microcavities. The measured ${g}^{(2)}(ensuremath{tau})$ exhibits damped oscillatory behavior when the input pump power exceeds a critical value. From a comparison between experiments and simulations, we attribute the measured oscillation of ${g}^{(2)}(ensuremath{tau})$ to self-pulsing (a limit cycle) emerging from an interplay between the photon, carrier, and thermal dynamics. Namely, the oscillation frequency of ${g}^{(2)}(ensuremath{tau})$ corresponds to the oscillation period of the limit cycle, while its finite coherence (damping) time originates from the stochastic nature of the limit cycle. From the standpoint of phase reduction theory, we interpret the measured coherence time of ${g}^{(2)}(ensuremath{tau})$ as the coherence (diffusion) time of a generalized phase of the limit cycle. Furthermore, we show that an increase in laser input power enhances the coherence time of ${g}^{(2)}(ensuremath{tau})$ up to the order of microseconds, which could be a demonstration of the stabilization of a stochastic limit cycle through pumping.
{"title":"Photon-correlation measurements of stochastic limit cycles emerging from high-\u0000Q\u0000 nonlinear silicon photonic crystal microcavities","authors":"N. Takemura, M. Takiguchi, H. Sumikura, E. Kuramochi, A. Shinya, M. Notomi","doi":"10.1103/PHYSREVA.102.011501","DOIUrl":"https://doi.org/10.1103/PHYSREVA.102.011501","url":null,"abstract":"We performed measurements of the photon correlation $[{g}^{(2)}(ensuremath{tau})]$ in driven nonlinear high-$Q$ silicon photonic crystal microcavities. The measured ${g}^{(2)}(ensuremath{tau})$ exhibits damped oscillatory behavior when the input pump power exceeds a critical value. From a comparison between experiments and simulations, we attribute the measured oscillation of ${g}^{(2)}(ensuremath{tau})$ to self-pulsing (a limit cycle) emerging from an interplay between the photon, carrier, and thermal dynamics. Namely, the oscillation frequency of ${g}^{(2)}(ensuremath{tau})$ corresponds to the oscillation period of the limit cycle, while its finite coherence (damping) time originates from the stochastic nature of the limit cycle. From the standpoint of phase reduction theory, we interpret the measured coherence time of ${g}^{(2)}(ensuremath{tau})$ as the coherence (diffusion) time of a generalized phase of the limit cycle. Furthermore, we show that an increase in laser input power enhances the coherence time of ${g}^{(2)}(ensuremath{tau})$ up to the order of microseconds, which could be a demonstration of the stabilization of a stochastic limit cycle through pumping.","PeriodicalId":22504,"journal":{"name":"The Japan Society of Applied Physics","volume":"113 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2020-01-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90732888","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}