TCAD Simulations Combined with Free Carrier Absorption Experiments Revealing the Physical Nature of Hydrogen-Related Donors in IGBTs

A. Korzenietz, F. Hille, F. Niedernostheide, C. Sandow, G. Wachutka, G. Schrag
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Abstract

Hydrogen-related donors can be advantageously used in IGBTs and power diodes with a view to creating field-stop layers and to optimising the electrical performance. In this work, the influence of hydrogen-related donors on the on-state plasma profile in field-stop IGBTs is analysed by means of free-carrier absorption measurements. For these investigations, dedicated IGBT test structures were used, which had been adapted to the specific properties of the employed measurement set-up. Two different hydrogen-related donor profiles were implanted into these IGBT samples and, subsequently, measurements with different current densities were compared to 2D TCAD numerical simulations. In the next step, the simulation models were adjusted, with respect to carrier lifetime and mobility to reflect the impact of a possible variation of these properties.
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TCAD模拟结合自由载流子吸收实验揭示了igbt中氢相关供体的物理性质
与氢相关的供体可以在igbt和功率二极管中有利地使用,以创建场阻挡层并优化电性能。在这项工作中,通过自由载流子吸收测量,分析了氢相关供体对场停止igbt中状态等离子体轮廓的影响。对于这些研究,使用了专用的IGBT测试结构,该结构已适应所使用的测量装置的特定属性。将两种不同的氢相关供体剖面植入这些IGBT样品中,随后将不同电流密度的测量结果与二维TCAD数值模拟进行比较。下一步,根据载流子寿命和迁移率调整仿真模型,以反映这些特性可能变化的影响。
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