Silicon microfabrication technologies for THz applications

C. Jung-Kubiak, J. Gill, T. Reck, C. Lee, J. Siles, G. Chattopadhyay, R. Lin, K. Cooper, I. Mehdi
{"title":"Silicon microfabrication technologies for THz applications","authors":"C. Jung-Kubiak, J. Gill, T. Reck, C. Lee, J. Siles, G. Chattopadhyay, R. Lin, K. Cooper, I. Mehdi","doi":"10.1109/SNW.2012.6243285","DOIUrl":null,"url":null,"abstract":"Silicon micromachining technology is naturally suited for making THz components, where precision and accuracy are essentials. We report here the development of robust micromachining techniques to enable novel active and passive components in the submillimeter-wave region. These features will enable large format submillimeter-wave heterodyne arrays and 3-D integration in the THz region, where fabricating circuits and structures becomes difficult with conventional machining.","PeriodicalId":6402,"journal":{"name":"2012 IEEE Silicon Nanoelectronics Workshop (SNW)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2012-06-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE Silicon Nanoelectronics Workshop (SNW)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SNW.2012.6243285","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 12

Abstract

Silicon micromachining technology is naturally suited for making THz components, where precision and accuracy are essentials. We report here the development of robust micromachining techniques to enable novel active and passive components in the submillimeter-wave region. These features will enable large format submillimeter-wave heterodyne arrays and 3-D integration in the THz region, where fabricating circuits and structures becomes difficult with conventional machining.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
太赫兹应用的硅微加工技术
硅微加工技术自然适合制造太赫兹元件,其中精度和准确性是必不可少的。我们在这里报告了鲁棒微加工技术的发展,以实现亚毫米波区域的新型有源和无源元件。这些特性将使大尺寸亚毫米波外差阵列和太赫兹区域的3-D集成成为可能,在太赫兹区域,传统加工难以制造电路和结构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Statistical variability study of a 10nm gate length SOI FinFET device A novel gate-all-around ultra-thin p-channel poly-Si TFT functioning as transistor and flash memory with silicon nanocrystals Quantum transport property in FETs with deterministically implanted single-arsenic ions using single-ion implantation Graphene fillers for ultra-efficient thermal interface materials Reduced drain current variability in fully depleted silicon-on-thin-BOX (SOTB) MOSFETs
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1