Determination of thickness and composition of thin Al{sub x}Ga{sub 1-x}As layers on GaAs by total electron yield (TEY)

M. Ebel, R. Svagera, H. Ebel, Robert Hobl, M. Mantler, J. Wernisch, N. Zagler
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引用次数: 2

Abstract

The measurement of the total electron yield (TEY) emitted from a solid specimen when irradiated by monochromatic x-rays is used for quantitative information on the specimen. For this purpose one has to determine the increase of TEY in the course of a variation of the photon energy from below to above the absorption edges of the specimen elements. These increases are the analytical quantities and are correlated with the composition of the specimen. The detected electrons are photo, Auger and secondary electrons. Most of them lost some of their original kinetic energy due to inelastic collisions along their path from the atom of origin to the surface. Low energy electrons are especially found in the secondary electron peak with electron energies of less than 20eV. Electrically nonconductive specimens under x-irradiation tend to positive surface charging. Thus, the relatively high flux of secondary electrons is more or less rejected by the grounded electron detector entrance. The amount of rejected secondary electrons depends on the charging potential. In order to avoid this charging dependent contribution to the TEY-increase the electron detector entrance is set to a negative bias and prevents generally low energy electrons from detection. It is the aim of themore » present investigations to extend the field of application of TEY from quantitative analysis of bulk specimens to thin films and to compare the results obtained by TEY with results from x-ray fluorescence analysis (XRF), electron probe micro analysis (EPMA) and x-ray photoelectron spectrometry (XPS). This comparison allows to demonstrate the application of TEY. For verification of the theoretical considerations, Al{sub x}Ga{sub 1-x}As layers on GaAs have been chosen. Values of layer thicknesses were in the range from 20 to 120 nm. An essential feature of TEY for this specific application is the escape depth of the electrons of approximately 100nm. 7 refs., 9 figs., 5 tabs.« less
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用总电子产率(TEY)测定GaAs上Al{sub x}Ga{sub 1-x}As薄层的厚度和组成
测量固体样品在单色x射线照射时发射的总电子产率(TEY)用于样品的定量信息。为此,我们必须确定光子能量从样品元素吸收边缘的下方到上方变化过程中TEY的增加。这些增加是分析量,与样品的组成有关。探测到的电子是光电子、俄歇电子和二次电子。它们中的大多数由于从起始原子到表面的路径上的非弹性碰撞而失去了一些原始动能。特别是在电子能量小于20eV的次级电子峰中发现了低能电子。不导电的试样在x射线照射下倾向于表面带正电荷。因此,相对高通量的二次电子或多或少被接地电子探测器入口拒绝。被丢弃的二次电子的数量取决于充电电位。为了避免这种电荷依赖对tey增加的贡献,电子探测器的入口被设置为负偏置,以防止通常低能量的电子被探测到。本研究的目的是将TEY的应用范围从块状样品的定量分析扩展到薄膜分析,并将TEY获得的结果与x射线荧光分析(XRF)、电子探针显微分析(EPMA)和x射线光电子能谱分析(XPS)的结果进行比较。这种比较可以演示TEY的应用。为了验证理论考虑,选择了GaAs上的Al{sub x}Ga{sub 1-x}As层。层厚的取值范围为20 ~ 120 nm。对于这种特定应用,TEY的一个基本特征是电子的逃逸深度约为100nm。七。参考文献, 9个无花果。, 5页。«少
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