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Determination of thickness and composition of thin Al{sub x}Ga{sub 1-x}As layers on GaAs by total electron yield (TEY) 用总电子产率(TEY)测定GaAs上Al{sub x}Ga{sub 1-x}As薄层的厚度和组成
Pub Date : 1995-12-31 DOI: 10.1154/s0376030800017729
M. Ebel, R. Svagera, H. Ebel, Robert Hobl, M. Mantler, J. Wernisch, N. Zagler
The measurement of the total electron yield (TEY) emitted from a solid specimen when irradiated by monochromatic x-rays is used for quantitative information on the specimen. For this purpose one has to determine the increase of TEY in the course of a variation of the photon energy from below to above the absorption edges of the specimen elements. These increases are the analytical quantities and are correlated with the composition of the specimen. The detected electrons are photo, Auger and secondary electrons. Most of them lost some of their original kinetic energy due to inelastic collisions along their path from the atom of origin to the surface. Low energy electrons are especially found in the secondary electron peak with electron energies of less than 20eV. Electrically nonconductive specimens under x-irradiation tend to positive surface charging. Thus, the relatively high flux of secondary electrons is more or less rejected by the grounded electron detector entrance. The amount of rejected secondary electrons depends on the charging potential. In order to avoid this charging dependent contribution to the TEY-increase the electron detector entrance is set to a negative bias and prevents generally low energy electrons from detection. It is the aim of themore » present investigations to extend the field of application of TEY from quantitative analysis of bulk specimens to thin films and to compare the results obtained by TEY with results from x-ray fluorescence analysis (XRF), electron probe micro analysis (EPMA) and x-ray photoelectron spectrometry (XPS). This comparison allows to demonstrate the application of TEY. For verification of the theoretical considerations, Al{sub x}Ga{sub 1-x}As layers on GaAs have been chosen. Values of layer thicknesses were in the range from 20 to 120 nm. An essential feature of TEY for this specific application is the escape depth of the electrons of approximately 100nm. 7 refs., 9 figs., 5 tabs.« less
测量固体样品在单色x射线照射时发射的总电子产率(TEY)用于样品的定量信息。为此,我们必须确定光子能量从样品元素吸收边缘的下方到上方变化过程中TEY的增加。这些增加是分析量,与样品的组成有关。探测到的电子是光电子、俄歇电子和二次电子。它们中的大多数由于从起始原子到表面的路径上的非弹性碰撞而失去了一些原始动能。特别是在电子能量小于20eV的次级电子峰中发现了低能电子。不导电的试样在x射线照射下倾向于表面带正电荷。因此,相对高通量的二次电子或多或少被接地电子探测器入口拒绝。被丢弃的二次电子的数量取决于充电电位。为了避免这种电荷依赖对tey增加的贡献,电子探测器的入口被设置为负偏置,以防止通常低能量的电子被探测到。本研究的目的是将TEY的应用范围从块状样品的定量分析扩展到薄膜分析,并将TEY获得的结果与x射线荧光分析(XRF)、电子探针显微分析(EPMA)和x射线光电子能谱分析(XPS)的结果进行比较。这种比较可以演示TEY的应用。为了验证理论考虑,选择了GaAs上的Al{sub x}Ga{sub 1-x}As层。层厚的取值范围为20 ~ 120 nm。对于这种特定应用,TEY的一个基本特征是电子的逃逸深度约为100nm。七。参考文献, 9个无花果。, 5页。«少
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引用次数: 2
Neutron and x-ray scattering studies of the metallurgical condition and residual stresses in Weldalite welds Weldalite焊缝中冶金条件和残余应力的中子和x射线散射研究
Pub Date : 1995-12-31 DOI: 10.2172/206556
S. Spooner, E. Pardue
Weldalite is a lithium-containing aluminum alloy which is being considered for aerospace applications because its favorable strength-to-weight ratio. Successful welding of this alloy depends on the control of the metallurgical condition and residual stresses in the heat affected zone. Neutron and x-ray scattering methods of residual stress measurement were applied to plasma arc welds made in aluminum-lithium alloy test panels as part of an evaluation of materials for use in welded structures. In the course of these studies discrepancies between x-ray and neutron results from the heat affected zone (HAZ) of the weld were found. Texture changes and recovery from the cold work, indicated in peak widths, were found in the HAZ as well. The consideration of x-ray and neutron results leads to the conclusion that there is a change in solute composition which modifies the d-spacings in the HAZ which affects the neutron diffraction determination of residual stresses. The composition changes give the appearance of significant compressive strains in the HAZ. This effect and sharp gradients in the texture give severe anomalies in the neutron measurement of residual stress. The use of combined x-ray and neutron techniques and the solution to the minimizing of the neutron diffraction anomalies are discussed.
Weldalite是一种含锂的铝合金,由于其良好的强度重量比,正被考虑用于航空航天应用。这种合金的成功焊接取决于对冶金条件和热影响区的残余应力的控制。作为焊接结构材料评估的一部分,将中子和x射线散射法应用于铝锂合金测试板的等离子弧焊。在这些研究过程中,发现了焊缝热影响区(HAZ)的x射线和中子结果之间的差异。冷加工后的织构变化和恢复(峰宽)也在热影响区发现。考虑了x射线和中子的结果,得出了溶质组成的变化,改变了热影响区d-间距,从而影响了中子衍射测定残余应力的结论。成分的变化使热影响区出现了显著的压缩应变。这种效应和织构中的尖锐梯度使残余应力的中子测量出现严重异常。讨论了x射线和中子联合技术的应用以及使中子衍射异常最小化的方法。
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引用次数: 1
Residual stress and microstructural characterization using Rietveld refinement of a carburized layer in a 5120 steel 利用Rietveld细化5120钢渗碳层的残余应力和显微组织表征
Pub Date : 1995-09-01 DOI: 10.2172/106610
P. Rangaswamy, M. Bourke, A. Lawson, J. Orourke, J. Goldstone
Rietveld refinement of X-ray diffraction patterns has been used to provide microstructural information complementary to conventional X-ray residual stress measurements through a carburized layer containing a maximum vol. 25 % of retained austenite. Layers in a simple specimen were removed incrementally by electropolishing and, at each depth in addition to conventional residual stress measurements in both the martensite and retained austenite, data were collected at {Psi} = 0 for Rietveld refinement. The refinements provide accurate values for the lattice parameters in the respective phases that can be related to carbon content and microstructure. Besides to providing qualitative information concerning the microstructure and possible surface decarburization, the c/a ratio of the martensite potentially offers an independent technique for determining carbon content profiles.
利用x射线衍射图的Rietveld细化技术,通过含有最大体积为25%的残余奥氏体的渗碳层,为传统的x射线残余应力测量提供了显微结构信息。通过电抛光逐步去除简单试样中的层,在每个深度,除了马氏体和残余奥氏体的常规残余应力测量外,还在{Psi} = 0处收集数据进行Rietveld细化。这些改进提供了与碳含量和微观结构相关的各相晶格参数的精确值。除了提供有关微观结构和可能的表面脱碳的定性信息外,马氏体的c/a比值可能为确定碳含量剖面提供一种独立的技术。
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引用次数: 2
Techniques for the Determination of Particle Size and Texture in Retained Austenite / Martensite Microstructures and Interpretation of the Measurements 残余奥氏体/马氏体显微组织中粒度和织构的测定技术及测量结果的解释
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022898
J. Makinson, W. N. Weins, Y. Xu, D. Medlin, R. V. Lawrence
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引用次数: 0
Residual Stress of Aluminum Thin Films Sputtered on Silicon Wafers Measured by X-Ray Diffraction 用x射线衍射测量铝薄膜溅射在硅片上的残余应力
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022679
Keisuke Tanaka, K. Ishihara, Y. Akiniwa
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引用次数: 0
X-Ray Stress Measurement of Ni-Ai System Intermetallic Compounds Ni-Ai系金属间化合物的x射线应力测量
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022643
Tokimasa Goto, Hiroyuki Tabata, Y. Hirose
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引用次数: 0
A Polycrystalline Thin Film Diffractometer for Asymmetric Diffraction Using Parallel Beam and High Resolution Parallel Slits 采用平行光束和高分辨率平行狭缝的非对称衍射多晶薄膜衍射仪
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022576
H. Toraya, J. Yoshino
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引用次数: 1
Comparison of Modelled and Experimental Data for the NixRu1-xAl Intermetaixic Compound in the Ni-Ru-Al Ternary System Ni-Ru-Al三元体系中NixRu1-xAl中间体的模拟与实验数据比较
Pub Date : 1995-01-01 DOI: 10.1154/S037603080002320X
A. Harte, P. M. Hung, I. Horner, N. Hall, L. Cornish, M. Witcomb
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引用次数: 1
An Order of Magnitude Improvement in Detection Limits Achieved by Using a New Sample Support in Small Spot Xrf Analysis. 在小点Xrf分析中使用新的样品支架,检测限提高了一个数量级。
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800023260
A. Nielson, D. Turner, Alisa A. Wilson, D. Wherry, R. Wong
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引用次数: 5
100 Years of Progress in X-Ray Fluorescence Analysis x射线荧光分析的百年进展
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022424
J. Gilfrich
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引用次数: 7
期刊
Advances in x-ray analysis
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