{"title":"Fluorine Implantation and Residual Stresses in Polysilicon Films","authors":"L. Lowery, P. Zschack, R. J. Angelis","doi":"10.1007/978-1-4615-1797-9_26","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"19 1","pages":"235-242"},"PeriodicalIF":0.0000,"publicationDate":"1994-08-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in x-ray analysis","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1007/978-1-4615-1797-9_26","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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