{"title":"Oxygen plasma treatment for wettability improvement of alkyl terminal self-assembled monolayer as gate dielectrics","authors":"K. Kuribara","doi":"10.7567/SSDM.2017.PS-10-03","DOIUrl":null,"url":null,"abstract":"We have improved wettability on alkyl self-assembled monolayer (SAM) with oxygen plasma treatment. Momentary plasma treatment onto gate dielectric surface causes threshold voltage shift of about 1 V and 50 % degradation of mobility. On the other hand, after long-time plasma treatment for 90 s, threshold voltage returns to almost initial value of -0.3 V. TFT with plasma treatment works within low operation voltage of 2.5V with mobility of 0.06 cm/Vs. Wettability of gate insulator surface is improved by plasma, and a TFT using drop cast semiconductor on lyophilic insulator surface shows mobility of 0.003 cm/Vs at 2.5 V.","PeriodicalId":22504,"journal":{"name":"The Japan Society of Applied Physics","volume":"114 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2017-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Japan Society of Applied Physics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.7567/SSDM.2017.PS-10-03","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We have improved wettability on alkyl self-assembled monolayer (SAM) with oxygen plasma treatment. Momentary plasma treatment onto gate dielectric surface causes threshold voltage shift of about 1 V and 50 % degradation of mobility. On the other hand, after long-time plasma treatment for 90 s, threshold voltage returns to almost initial value of -0.3 V. TFT with plasma treatment works within low operation voltage of 2.5V with mobility of 0.06 cm/Vs. Wettability of gate insulator surface is improved by plasma, and a TFT using drop cast semiconductor on lyophilic insulator surface shows mobility of 0.003 cm/Vs at 2.5 V.