The Effect of Different Stress Conditions on MONOS Breakdown for 3D NAND Flash Memory

Junpeng He, X. Tian, Hekun Zhang, Zhe Song, Qianqian Yu, Liang Li, Ming Li, Liming Gao
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Abstract

The influence of different stress methods on Metal-Oxide-Nitride-Oxide-Silicon (MONOS) layer breakdown was investigated. In this paper, two different stress modes, DC and AC stress, were applied to systematically study stress condition effects on MONOS breakdown. According to the electrical failure analysis (EFA) results, MONOS layer is more vulnerable to dielectric breakdown under AC stress due to its higher defects generation efficiency. Besides, the physical failure analysis (PFA) revealed different breakdown mechanisms for DC and AC stress modes. These results help understand different stress methods impact on 3D NAND flash reliability.
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不同应力条件对3D NAND闪存中MONOS击穿的影响
研究了不同应力方法对金属-氧化物-氮化物-氧化物-硅(MONOS)层击穿的影响。本文采用直流和交流两种不同的应力模式,系统地研究了应力条件对MONOS击穿的影响。电气失效分析(EFA)结果表明,由于MONOS层具有较高的缺陷产生效率,因此在交流应力下更容易发生介质击穿。此外,物理破坏分析(PFA)揭示了直流和交流应力模式下不同的击穿机制。这些结果有助于了解不同应力方法对3D NAND闪存可靠性的影响。
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