A 16nm dual-port SRAM with partial suppressed word-line, dummy read recovery and negative bit-line circuitries for low VMIN applications

Yen-Huei Chen, Kao-Cheng Lin, Ching-Wei Wu, W. Chan, J. Liaw, H. Liao, Jonathan Chang
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引用次数: 9

Abstract

A total solution for 8T dual-port (DP) SRAM to improve its operating voltage range (VMIN/VMAX) is proposed. Partial suppressed word-line (PSWL) technique improves the static noise margin (SNM) when both ports (A, B ports) access at the same time. Dummy read recovery (DRR) and negative bit-line (NBL) techniques are introduced to eliminate the dummy read induced write recovery failure and write contention failure, respectively. The silicon results show that the VDD operation window can be improved from 220mV to 570mV in 16nm FinFET technology.
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一种16nm双端口SRAM,具有部分抑制字线、虚拟读取恢复和负位线电路,适用于低VMIN应用
提出了一种提高8T双端口SRAM工作电压范围(VMIN/VMAX)的整体解决方案。部分抑制字线(PSWL)技术提高了两个端口(A、B端口)同时接入时的静态噪声裕度(SNM)。引入虚拟读恢复技术(DRR)和负位线技术(NBL),分别消除虚拟读引起的写恢复失败和写争用失败。结果表明,在16nm FinFET技术下,VDD操作窗口可以从220mV提高到570mV。
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