电阻互连定位

E. I. Cole, P. Tangyunyong, C. Hawkins, M. Bruce, V. Bruce, R. Ring, W.-L. Chong
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引用次数: 43

摘要

电阻互连定位(RIL)是一种新的扫描激光显微镜分析技术,可以直接和快速地从正面和背面定位有缺陷的IC过孔、触点和导体。RIL在功能测试期间使用扫描激光在IC互连中产生局部热梯度。IC局部加热时合格/不合格状态的变化可识别出失效部位。该技术将定位电阻通孔的时间从几个月缩短到几分钟。介绍了缺陷过孔的来源、RIL信号产生的物理原理以及RIL分析的实例。
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Resistive interconnection localization
Resistive interconnection localization (RIL) is a new scanning laser microscope analysis technique that directly and rapidly localizes defective IC vias, contacts, and conductors from the front side and backside. RIL uses a scanned laser to produce localized thermal gradients in IC interconnections during functional testing. A change in the pass/fail state with localized heating of the IC identifies the failing site. The technique reduces the time to locate a resistive via from months to minutes. The sources of defective vias, the physics of RIL signal generation, and examples of RIL analysis are presented.
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