利用硅载体表征高达40 GHz的倒装芯片微连接

C. Patel, P. Andry, K. Jenkins, B. Dang, R. Horton, R. Polastre, C. Tsang
{"title":"利用硅载体表征高达40 GHz的倒装芯片微连接","authors":"C. Patel, P. Andry, K. Jenkins, B. Dang, R. Horton, R. Polastre, C. Tsang","doi":"10.1109/IITC.2005.1499952","DOIUrl":null,"url":null,"abstract":"Electrical characterization results of fine pitch flip chip interconnections, called microjoins, using a silicon carrier are reported. Microjoins with 50 /spl mu/m diameter, 100 /spl mu/m pitch are assembled onto a silicon carrier and characterized up to 40 GHz using transmission line test macros. Time and frequency domain measurements of a single 50 /spl mu/m diameter microjoin give 6 ps delay and less than -0.5 dB transmission losses up to 40 GHz.","PeriodicalId":156268,"journal":{"name":"Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005.","volume":"199 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Characterization of flip chip microjoins up to 40 GHz using silicon carrier\",\"authors\":\"C. Patel, P. Andry, K. Jenkins, B. Dang, R. Horton, R. Polastre, C. Tsang\",\"doi\":\"10.1109/IITC.2005.1499952\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Electrical characterization results of fine pitch flip chip interconnections, called microjoins, using a silicon carrier are reported. Microjoins with 50 /spl mu/m diameter, 100 /spl mu/m pitch are assembled onto a silicon carrier and characterized up to 40 GHz using transmission line test macros. Time and frequency domain measurements of a single 50 /spl mu/m diameter microjoin give 6 ps delay and less than -0.5 dB transmission losses up to 40 GHz.\",\"PeriodicalId\":156268,\"journal\":{\"name\":\"Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005.\",\"volume\":\"199 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-06-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IITC.2005.1499952\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IITC.2005.1499952","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

本文报道了使用硅载流子的细间距倒装芯片互连(称为微连接)的电特性。直径为50 /spl mu/m,间距为100 /spl mu/m的微连接被组装在硅载体上,并使用传输线测试宏进行高达40 GHz的表征。单个直径50 /spl mu/m的微连接的时域和频域测量提供6 ps延迟和小于-0.5 dB的传输损耗,高达40 GHz。
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Characterization of flip chip microjoins up to 40 GHz using silicon carrier
Electrical characterization results of fine pitch flip chip interconnections, called microjoins, using a silicon carrier are reported. Microjoins with 50 /spl mu/m diameter, 100 /spl mu/m pitch are assembled onto a silicon carrier and characterized up to 40 GHz using transmission line test macros. Time and frequency domain measurements of a single 50 /spl mu/m diameter microjoin give 6 ps delay and less than -0.5 dB transmission losses up to 40 GHz.
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