亚微米双异质结应变InAlAs/InGaAs HEMTs:直流和微波特性的实验研究

G. Ng, R. Lai, D. Pavlidis, J. Pamulapati, P. Bhattacharya, K. Studer-Rabeler
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引用次数: 1

摘要

研究了亚微米栅极长度的应变双异质结InAlAs/InGaAs hemt的直流和微波特性。低输出电导,(16-18毫秒/毫米),即使在短(0.25- μ m)栅极长度保留。这些器件的外部f/sub T/和f/sub max/分别高达82 GHz和148 GHz。这些结果表明,利用双异质结方法和相关的改进载流子约束来提高功率增益性能的可能性。不同栅极长度器件的微波特性表明,有效载流子速度约为1.2*10/sup 7/ cm/s,表明载流子输运可能受到反向异质界面质量的限制。生长中断优化可以进一步提高这些器件的性能。
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Submicron double heterojunction strained InAlAs/InGaAs HEMTs: an experimental study of DC and microwave properties
The DC and microwave characteristics of strained double-heterojunction InAlAs/InGaAs HEMTs with submicron gate lengths are presented. Low output conductance, (16-18 mS/mm) is retained even at short (0.25- mu m) gate length. Extrinsic f/sub T/ and f/sub max/ for these devices are as high as 82 GHz and 148 GHz, respectively. These results show the possibility of using the double-heterojunction approach and the associated improved carrier confinement in order to enhance the power gain performance. Microwave characterization of devices with different gate lengths revealed an effective carrier velocity of approximately 1.2*10/sup 7/ cm/s, indicating that carrier transport may be limited by the quality of the inverted heterointerface. Growth interruption optimization may further improve the performance of these devices.<>
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Expertise, optimisation and control of InP and related technologies by scanning photoluminescence measurements Dislocation density after S-diffusion into p-type InP substrates Surface recombination and high efficiency in InP solar cells Molecular beam epitaxial growth techniques for graded-composition InGaAlAs/InP alloys Submicron double heterojunction strained InAlAs/InGaAs HEMTs: an experimental study of DC and microwave properties
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